2020
DOI: 10.1021/acsaelm.0c00832
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Hafnia-Based Double-Layer Ferroelectric Tunnel Junctions as Artificial Synapses for Neuromorphic Computing

Abstract: Ferroelectric tunnel junctions (FTJ) based on hafnium zirconium oxide (Hf1-xZrxO2; HZO) are a promising candidate for future applications, such as low-power memories and neuromorphic computing. The tunneling electroresistance (TER) is tunable through the polarization state of the HZO film. To circumvent the challenge of fabricating thin ferroelectric HZO layers in the tunneling range of 1-3 nm range, ferroelectric/dielectric double layer sandwiched between two 2 symmetric metal electrodes are used. Due to the … Show more

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Cited by 101 publications
(120 citation statements)
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“…Subsequently, an I(V) sweep in the range +/-300 mV measures the resistance. In this section, we address both the programmability of the device for inference and its response under pulses of varying sign, amplitude and width, emulating the combination of presynaptic pulses (negative bias) and post-synaptic pulses (positive bias), described for example in [25] or [12].…”
Section: A Ferroelectric Memristormentioning
confidence: 99%
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“…Subsequently, an I(V) sweep in the range +/-300 mV measures the resistance. In this section, we address both the programmability of the device for inference and its response under pulses of varying sign, amplitude and width, emulating the combination of presynaptic pulses (negative bias) and post-synaptic pulses (positive bias), described for example in [25] or [12].…”
Section: A Ferroelectric Memristormentioning
confidence: 99%
“…The resistive switching effect was also obtained using CMOS-compatible materials: the metastable, ferroelectric phase of hafnia [20]. In the work of Max et al [12] or Berdan et al [3], a 10 nm thick HfO2 layer is combined with an oxide interlayer acting as the tunnel barrier. The device operates under a read voltage as high as 2 V to allow transport across the HfO2 layer, and large "On/Off" ratios (ratio between the conductance in the low and high resistive states) are obtained.…”
Section: Introductionmentioning
confidence: 99%
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“…The change in the polarization state, i.e., the change in the device resistance, is used to store information. It is possible to obtain multilevel storage in reasonably large devices hosting several domains by properly engineering the applied programming voltage [24,25]. Of particular interest is that FTJs allow for a non-destructive reading operation by applying an electric field smaller than the E c of the ferroelectric layer.…”
Section: Basic Device Operating Principlementioning
confidence: 99%
“…in non-volatile SRAM (NV-SRAM) cells as discussed in section III B). However, for application as weighting elements in the analog vector-matrixmultiplication based on Ohm's and Kirchhoff's law [23] or as synaptic weighting element [24], a gradual switching is important to attain multiple intermediate resistance states. Hence, not only a proper selection of the programming voltages that are constrained by the CMOS technology, but a suitable choice of the programming pulse width is very important and has to be adapted to the specific FTJ device.…”
Section: B Ftj Programming Characteristicsmentioning
confidence: 99%