H/sub /spl alpha// emission as a feedback control sensor for reactive sputter deposition of nano-structured, diamond-like carbon coatings

Carlson, E.P.; Hazelton, R. C.; Yadlowsky, E. J.; Feng, B.; Taher, M. A.; Meyer, Harry M.

doi:10.1109/tps.2005.844531

Cited by 3 publications

(2 citation statements)

References 13 publications

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“…DLC can be deposited by various methods, for example, PBIID-type techniques [97][98][99][100]. PBIID is an especially effective technique for treating the inner surface of a cylinder (or tube), as shown in Figure 15 [100,101].…”

Section: Plasma-based Ion Implantation and Depositionmentioning

confidence: 99%

Industrial Applications of Pulsed Power Technology

Akiyama

Sakugawa

Namihira

et al. 2007

IEEE Trans. Dielect. Electr. Insul.

311

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A review of mainly the past two years is undertaken of the industrial applications of pulsed power. Repetitively operated pulsed power generators with a moderate peak power have been developed for industrial applications. These generators are reliable and have low maintenance. Development of the pulsed power generators helps promote industrial applications of pulsed power for such things as food processing, medical treatment, water treatment, exhaust gas treatment, ozone generation, engine ignition, ion implantation and others. Here, industrial applications of pulsed power are classified by application for biological effects, for pulsed streamer discharges in gases, for pulsed discharges in liquid or liquidmixture, and for material processing.Index Terms -Pulsed power, industrial application, bioelectrics, exhaust gas treatment, discharge in liquid, material processing.

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Section: Plasma-based Ion Implantation and Depositionmentioning

confidence: 99%

Industrial Applications of Pulsed Power Technology

Akiyama

Sakugawa

Namihira

et al. 2007

IEEE Trans. Dielect. Electr. Insul.

311

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“…16,17) Magnetron sputtering with addition of a reactive background gas (reactive sputtering) is commonly used to prepare DLCbased composite films. 18,19) DLC films can be prepared using the shunting arc discharge employing a carbon rod as a solid material. 7) DLC-based composite films can also be prepared using the carbon shunting arc with addition of reactive gases.…”

Section: Introductionmentioning

confidence: 99%

Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition

Takaki¹,

Murakami²,

Mukaigawa³

et al. 2010

Jpn. J. Appl. Phys.

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A carbon-shunting arc discharge was generated with a titanium cathode for titanium-containing carbon plasma production to deposit carbon-based hybrid films. A carbon rod of 2 mm diameter and 40 mm length was employed for generation of the carbon shunting arc discharge. A silicon substrate was immersed into the plasma, and a series of negative pulse voltages were applied to the substrate holder synchronized with shunting arc discharge ignition. The cathode side rod holder material was changed from carbon to titanium to supply holder material particles into the carbon shunting arc plasma. The shunting arc plasma was successfully produced for both rod holder materials. Heating energy to generate the shunting arc was reduced using titanium as the cathode side holder material. A spectroscopic measurement from plasma light emission showed that the produced plasma contained titanium ions at employing titanium as the cathode material. The ions contained in the produced plasma were extracted with -2.0 kV negative pulse voltage. The ion current at the titanium cathode was larger value than that of the carbon cathode. X-ray photoelectron spectroscopy showed that the prepared carbon films contained titanium and showed a Ti/C ratio of 0.099 at 1200 V charging voltage of a 200 µF capacitor.

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A Review of Statistical Methods for Quality Improvement and Control in Nanotechnology

Jeng²,

Wang

2009

Journal of Quality Technology

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H/sub /spl alpha// emission as a feedback control sensor for reactive sputter deposition of nano-structured, diamond-like carbon coatings

Cited by 3 publications

References 13 publications

Industrial Applications of Pulsed Power Technology

Industrial Applications of Pulsed Power Technology

Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition

A Review of Statistical Methods for Quality Improvement and Control in Nanotechnology

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