1997
DOI: 10.1063/1.119102
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H 2 damage of ferroelectric Pb(Zr,Ti)O3 thin-film capacitors—The role of catalytic and adsorptive activity of the top electrode

Abstract: Large-scale integrated fabrication in a H2 containing atmosphere, for example, during the passivation process, can cause serious damage in metal/Pb(Zr,Ti)O3/metal capacitors (i.e., Pt/PZT/Pt capacitors). To reveal the cause of the H2 damage, we investigated the behavior of hysteresis curves and the leakage current of capacitors with a top electrode of Pt, Pd, Au, or Ag. Capacitors with a top electrode of Au or Ag are more resistant to the H2 annealing damage than those of Pt or Pd. We found that the H2 damage … Show more

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Cited by 133 publications
(62 citation statements)
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“…The created space charge might pin domain motion and cause a voltage shift and suppression of the hysteresis loop. Recently, Raman analysis revealed the formation of OH Ϫ complexes in the PZT lattice 2. The O-H dipole may align according to the polarization of the ferroelectric and prevent polarization reversal.…”
mentioning
confidence: 99%
“…The created space charge might pin domain motion and cause a voltage shift and suppression of the hysteresis loop. Recently, Raman analysis revealed the formation of OH Ϫ complexes in the PZT lattice 2. The O-H dipole may align according to the polarization of the ferroelectric and prevent polarization reversal.…”
mentioning
confidence: 99%
“…12 In FeRAMs, hydrogen from the forming gas anneal can cause a loss of switchable polarization ͑fatigue͒ and higher leakage currents. [13][14][15] This problem requires the use of diffusion barriers in real devices. It has been known that hydrogen acts as a donor in BaTiO 3 ͑Ref.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, the Pt-EL aft is also slightly identifiable as an area that shows weaker intensity than the other area. This result suggests that a reduced Bi-2212 layer is formed in the vicinity of the Pt-EL bef due to the reduction effect of hydrogen ions [13], which are generated by the assistance of catalytic effect of Pt [14], and the resistive switching effect takes place in the reduced Bi-2212 layer. The strong reduction of Bi-2212 by hydrogen annealing that is assisted by the catalytic effect of Pt is crucial for developing the resistive switching.…”
Section: Resultsmentioning
confidence: 92%