Guided growth of neurons and glia using microfabricated patterns of parylene-C on a SiO2 background

Delivopoulos, Evangelos; Murray, Alan F.; MacLeod, Nicholas; Curtis, John C.

doi:10.1016/j.biomaterials.2008.12.049

Cited by 47 publications

(77 citation statements)

References 37 publications

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“…The authors have also investigated the protein adhesive properties of parylene-C/SiO 2 substrates. This recently pioneered and patented [13] method has demonstrated that it is possible to accurately pattern primary rat neurons and astrocytes [14] and more recently human neurons [15] on silicon chips, in a reliable and robust manner.…”

Section: Introductionmentioning

confidence: 99%

Isolating single primary rat hippocampal neurons & astrocytes on ultra-thin patterned parylene-C/silicon dioxide substrates

et al. 2011

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Section: Introductionmentioning

confidence: 99%

Isolating single primary rat hippocampal neurons & astrocytes on ultra-thin patterned parylene-C/silicon dioxide substrates

et al. 2011

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“…Once prepared, activation of chips in fetal bovine serum enables a wide range of cell types to be patterned in culture. Our group has successfully patterned primary murine hippocampal cells [14][15][16] , the HEK 293 cell line 17 , the human neuron-like teratocarcinoma (hNT) cell line 18 , primary murine cerebellar granule cells, and primary human glioma-derived stem-like cells. Figure 4 illustrates the potential to augment the patterning platform by using alternative activation solutions.…”

Section: Protocol Representative Resultsmentioning

confidence: 99%

Cell Patterning on Photolithographically Defined Parylene-C: SiO<sub>2</sub> Substrates

Hughes

Brennan

Bunting

et al. 2014

JoVE

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Cell patterning platforms support broad research goals, such as construction of predefined in vitro neuronal networks and the exploration of certain central aspects of cellular physiology. To easily combine cell patterning with Multi-Electrode Arrays (MEAs) and silicon-based 'lab on a chip' technologies, a microfabrication-compatible protocol is required. We describe a method that utilizes deposition of the polymer parylene-C on SiO 2 wafers. Photolithography enables accurate and reliable patterning of parylene-C at micron-level resolution. Subsequent activation by immersion in fetal bovine serum (or another specific activation solution) results in a substrate in which cultured cells adhere to, or are repulsed by, parylene or SiO 2 regions respectively. This technique has allowed patterning of a broad range of cell types (including primary murine hippocampal cells, HEK 293 cell line, human neuron-like teratocarcinoma cell line, primary murine cerebellar granule cells, and primary human glioma-derived stem-like cells). Interestingly, however, the platform is not universal; reflecting the importance of cell-specific adhesion molecules. This cell patterning process is cost effective, reliable, and importantly can be incorporated into standard microfabrication (chip manufacturing) protocols, paving the way for integration of microelectronic technology.

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“…radiation sensors can utilize it as absorbent film. Finally, progress in revealing biocompatibility in cell-microdevice interface suggests that silicon nanostructuring can beneficially influence cell adhesion [Turner, 1997;Moxon, 2004] and growth [Delivopoulos, 2009], which can be cell-specifically designed using BPS. In the above examples BPS can be applied both as seed layer, sacrificial layer or functional material.…”

Section: Further Possible Applicationsmentioning

confidence: 99%

Black poly-silicon: A nanostructured seed layer for sensor applications

Fekete

Horváth

Bérces

et al. 2014

Sensors and Actuators A: Physical

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Abstract:Nanostructured silicon surfaces like black-silicon (b-Si) are of great interest in current sensor technology. This paper presents an alternative method to fabricate b-Si in poly-silicon thin film prepared on pre-deposited insulation layer in order to open new door to the integration of silicon nanograss in biosensor application as sensing or seed layer. In our experiment, black poly-silicon (BPS) is formed in LPCVD deposited poly-silicon thin film by deep reactive ion etching (DRIE) at cryogenic temperature in SF 6 +O 2 plasma. Etching parameters like temperature, O 2 flow and RF power is varied and morphology of the resultant thin film is analyzed by scanning electron microscopy. The fabricated samples are subjected to a comparative investigation, which contained pillar density, directionality, etch rate and loading effects. The effect of the grain size of poly-silicon layer is analyzed and compared to samples micromachined in single-crystalline silicon (c-Si). We found that fabrication parameters of BPS morphology significantly differ from that of conventional b-Si realized in c-Si substrate. A simple application example of our BPS layer for increasing specific surface area of potential sensors is also demonstrated. As far as we know, this is the first demonstration and systematic study of b-Si fabrication in poly-silicon thin film.

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Guided growth of neurons and glia using microfabricated patterns of parylene-C on a SiO2 background

Cited by 47 publications

References 37 publications

Isolating single primary rat hippocampal neurons & astrocytes on ultra-thin patterned parylene-C/silicon dioxide substrates

Isolating single primary rat hippocampal neurons & astrocytes on ultra-thin patterned parylene-C/silicon dioxide substrates

Cell Patterning on Photolithographically Defined Parylene-C: SiO<sub>2</sub> Substrates

Black poly-silicon: A nanostructured seed layer for sensor applications

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