Growth Temperature Effects in Nanoscale-Thick GaTe Films on c-Sapphire Substrate by Molecular Beam Epitaxy: Implications for High-Performance Optoelectronic Devices
Nand Kumar,
Santanu Kandar,
Kamlesh Bhatt
et al.
Abstract:Gallium telluride thin films have emerged as a promising material for various electronic and optoelectronic applications due to their unique properties. In this study, we investigate the growth of nanometer-thick GaTe films on sapphire substrates using molecular beam epitaxy and explore the influence of the growth temperature on the structural, electronic, and optical properties of the films. X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and Raman measurements are employed … Show more
The polymorphic nature of ultrathin transition metal dichalcogenide (TMDC) materials makes phase engineering of these materials an interesting field of investigation. Understanding the phase-controlling behavior of different growth parameters is...
The polymorphic nature of ultrathin transition metal dichalcogenide (TMDC) materials makes phase engineering of these materials an interesting field of investigation. Understanding the phase-controlling behavior of different growth parameters is...
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.