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2012
DOI: 10.1063/1.3674985
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Growth temperature dependence of exciton lifetime in wurtzite InP nanowires grown on silicon substrates

Abstract: InP nanowires grown on silicon substrate are investigated using time-resolved spectroscopy. A strong modification of the exciton lifetime is observed (from 0.11 to 1.2 ns) when the growth temperature is increased from 340 °C to 460 °C. This strong dependence is not related to the density of zinc-blende insertions in the wurtzite nanowires or to the wurtzite exciton linewidth. The excitation power dependence of the lifetime and linewidth is investigated, and these results allow us to interpret the growth temper… Show more

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Cited by 23 publications
(26 citation statements)
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“…This step is followed by decreasing the sample temperature to 380°C corresponding to the optimal growth temperature to obtain pure WZ InP NWs, with an In flux corresponding to an InP 2D layer growth rate equal to 1 µm/h and a V/III BEP ratio = 20. 50 Prior to the NW growth, the P2 flux is opened for 10 sec to form InP pedestals with an Au droplet on it. 19 Then, the In shutter is opened to start the InP NW growth.…”
Section: Methodsmentioning
confidence: 99%
“…This step is followed by decreasing the sample temperature to 380°C corresponding to the optimal growth temperature to obtain pure WZ InP NWs, with an In flux corresponding to an InP 2D layer growth rate equal to 1 µm/h and a V/III BEP ratio = 20. 50 Prior to the NW growth, the P2 flux is opened for 10 sec to form InP pedestals with an Au droplet on it. 19 Then, the In shutter is opened to start the InP NW growth.…”
Section: Methodsmentioning
confidence: 99%
“…This especially holds for nanowires (NWs) based on III–V semiconducting compounds . A unique aspect of III–V nanowires is the possibility to grow them in hexagonal wurtzite ( wz ) structure with space group P6 3 mc (normalC6v4) despite the fact that the corresponding bulk materials crystallize in the cubic zinc‐blende ( zb ) geometry with space group Ftrue4¯3m (normalTd2) with the exception of group‐III nitrides …”
Section: Introductionmentioning
confidence: 99%
“…InP nanostructure is known as a promising candidate for extensive applications in optoelectronic devices due to its small direct band gap (1.38 eV) , high electron mobility and large exciton Bohr radii (∼20 nm) . Up to date, InP nanowires have been synthesized by various methods, such as metal organic vapor phase epitaxy , laser catalytic growth , molecular beam epitaxy , and metalorganic chemical vapor deposition (MOCVD) . However, very few papers in the literature were reported on the growth of single‐crystalline InP nanowires by CVD route, which is much simpler and economical in comparison to the other methods.…”
Section: Introductionmentioning
confidence: 99%