Gallium is widely used in liquid metal catalyst fabrication,
and
its oxidized species is a well-known dielectric material. In the past
decades, these two species have been well studied separately. However,
the surface oxide layer-induced impact on the chemical and electronic
structure of (liquid) gallium is still mostly unclear because of the
extreme fast formation of thermodynamically stable surface Ga2O3. In this study, we used a combination of direct
and inverse photoemission complemented by scanning electron microscopy
to examine the surface properties of Ga and Ga oxide (on a SiO
x
/Si support) and the evolution of the surface
structure upon stepwise oxidation and subsequent reduction at an elevated
temperature. We find oxidation time-dependent self-limited formation
of a substoichiometric Ga2O3−δ surface
layer on the Ga nanoparticles. The valence band maximum (conduction
band minimum) for this Ga2O3−δ is
located at −3.8 (±0.1) eV [1.4 (±0.2) eV] with respect
to the Fermi level, resulting in an electronic surface band gap of
5.2 (±0.2) eV. Upon annealing in ultrahigh vacuum conditions,
the Ga2O3−δ surface layer can efficiently
be removed when using temperatures of 600 °C and higher. This
study reveals how the surface properties of Ga nanoparticles are influenced
by stepwise oxidation–reduction, providing detailed insights
that will benefit the optimization of this material class for different
applications.