Growth of β-FeSi₂ Thin Films on Silicon Substrates by Pulsed Laser Deposition Using ε-FeSi Alloy Targets

Abstract

The growth of highly oriented β-FeSi2 thin films on Si substrates was successfully demonstrated by pulsed laser deposition using ε-FeSi alloy targets. In our method, Si atoms are supplied from the substrate and a surface reaction occurs to form the β-FeSi2 layer. This growth process produces a sharp interface between the film and the substrate.