Growth of thin, flat, epitaxial () oriented gold films on c-cut sapphire

Kästle, G.; Boyen, Hans‐Gerd; Koslowski, B.; Plettl, Alfred; Weigl, F.; Ziemann, P.

doi:10.1016/s0039-6028(01)01685-5

Cited by 40 publications

(41 citation statements)

References 20 publications

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“…The details are described in ref. [28] The samples are structured with standard photo lithography techniques and wet etching in I/KI solution [39] or etched in an RIE-plasma process (Oxford instruments, RIE-PlasmaLab 80Plus). The pattern is shown schematically in Figure 6.…”

Section: Sample Preparationmentioning

confidence: 99%

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Electrical Resistivity of Epitaxial Au Films Surface‐Modulated by Arrays of Pt Nanoparticles

et al. 2005

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Arrays of Pt nanoparticles with a high degree of hexagonal short-range order are deposited by means of self-assembly of diblock-copolymers on top of high quality epitaxial Au films and their influence on the electrical properties is studied. The temperature-dependent resistivity of the nanomodulated Au films is surprisingly well described by the classical size effect model of Fuchs-Sondheimer, which is based on a mixture of diffuse and specular surface scattering events. Especially, no specific influence of the interparticle

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Section: Sample Preparationmentioning

confidence: 99%

“…All these requirements are met by epitaxial Au films grown on sapphire with a Nb seedlayer. [28] Results and Discussion…”

Section: Introductionmentioning

confidence: 99%

Electrical Resistivity of Epitaxial Au Films Surface‐Modulated by Arrays of Pt Nanoparticles

et al. 2005

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“…[13] Later, Hatton et al [14] reported optical transmission measurements on ultra-thin gold films deposited on silanized glass, but did not compare the results to a detailed structural analysis or theoretically expected transmission spectra. The method of surface activation with mercapto-silane is easier and less costly than some other fabrication procedures reported recently [15,16] and does not compromise the optical quality of ultra-thin films, as is the case when metallic adhesion/seeding layers (typically Ti, Cr, Ge or Ni) are used. [17] It should be noted that a substantial amount of research has also been devoted to ultra-thin silver films and their optical properties, where many of the same problems and applications are encountered.…”

Section: Introductionmentioning

confidence: 99%

Optical and Structural Properties of Ultra‐thin Gold Films

Kossoy

Merk

Simakov

et al. 2014

Advanced Optical Materials

127

100

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Realizing laterally continuous ultra-thin gold films on transparent substrates is a challenge of significant technological importance. In the present work, formation of ultra-thin gold films on fused silica is studied, demonstrating how suppression of island formation and reduction of plasmonic absorption can be achieved by treating substrates with (3-mercaptopropyl) trimethoxysilane prior to deposition. Void-free films with deposition thickness as low as 5.4 nm were realized and remained structurally stable at room temperature. Based on detailed structural analysis of the films by specular and diffuse X-ray reflectivity measurements, it is shown that optical transmission properties of continuous ultra-thin films can be accounted for 2 using the bulk dielectric function of gold. However, it is important to take into account the non-abrupt transition zone between the metal and the surrounding dielectrics, which extends through several lattice constants for the laterally continuous ultra-thin films (film thickness below 10 nm). This results in a significant reduction of optical transmission, as compared to the case of abrupt interfaces. These findings imply that the atomic-scale interface structure plays an important role when continuous ultra-thin films are considered, e.g., as semitransparent electrical contacts, since optical transmission deviates significantly from the theoretical predictions for ideal films.

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“…Unfortunately, in cases where it is desirable to utilize the properties of thin, smooth, continuous metal films on dielectric substrates, this mode of film formation is directly detrimental. Structural imperfections lead to, e.g., increased optical absorption over a wide range of wavelengths due to excitation of localized plasmon resonances, increased scattering in surface plasmon polariton waveguides, decreased imaging contrast in plasmon-assisted superlens lithography [ 8 ], as well as increased electrical resistance due to film discontinuity and non-specular reflection of electrons [ 9 ].…”

Section: Introductionmentioning

confidence: 99%

Ultra-thin gold films on transparent polymers

et al. 2013

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Fabrication of continuous ultra-thin gold films ( < 10 nm) on the surface of optical polymers (CYCLOTENE and ORMOCLEAR) is reported. Using a range of electrical, optical and structural characterization techniques, we show that polymers can be superior to more conventional (inorganic) materials as optical substrates for realizing ultra-thin gold films. Using these transparent polymer substrates, smooth, patternable gold films can be fabricated with conventional deposition techniques at room temperature, without adhesion or seeding layers, facilitating new photonic and plasmonic nanostructures, including transparent electrical contacts, thin film waveguides, metamaterials, biosensors and high-contrast superlenses.

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Growth of thin, flat, epitaxial () oriented gold films on c-cut sapphire

Cited by 40 publications

References 20 publications

Electrical Resistivity of Epitaxial Au Films Surface‐Modulated by Arrays of Pt Nanoparticles

Electrical Resistivity of Epitaxial Au Films Surface‐Modulated by Arrays of Pt Nanoparticles

Optical and Structural Properties of Ultra‐thin Gold Films

Ultra-thin gold films on transparent polymers

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