2014
DOI: 10.3389/fmats.2014.00014
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Growth of the [110] Oriented TiO2 Nanorods on ITO Substrates by Sputtering Technique for Dye-Sensitized Solar Cells

Abstract: TiO 2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO 2 films. When the pressure is lower than 1 Pa, the deposited film has a dense structure and shows a preferred orientation along the [101] direction. However, the nanorod structure has been obtained as the sputtering pressure is higher than 1 Pa. These nanorod structure TiO 2 films show a preferred ori… Show more

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Cited by 11 publications
(6 citation statements)
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“…In comparison to its particulate forms, the structure of the TiO2 nanorod has a larger surface area [8]. Chemical bath deposition (CBD), hydrothermal approach, solvothermal, chemical vapor deposition (CVD), and DC reactive magnetron sputtering are some of the synthetic procedures for generating TiO2 nanorod structures that have been documented [9,10]. The high reactivity of reactants, facile regulation of solution or interfacial reactions, creation of metastable and distinctive condensed phases, decreased air pollution, and low energy consumption all contributed to the growing interest in hydrothermally synthesized compounds.…”
Section: Introductionmentioning
confidence: 99%
“…In comparison to its particulate forms, the structure of the TiO2 nanorod has a larger surface area [8]. Chemical bath deposition (CBD), hydrothermal approach, solvothermal, chemical vapor deposition (CVD), and DC reactive magnetron sputtering are some of the synthetic procedures for generating TiO2 nanorod structures that have been documented [9,10]. The high reactivity of reactants, facile regulation of solution or interfacial reactions, creation of metastable and distinctive condensed phases, decreased air pollution, and low energy consumption all contributed to the growing interest in hydrothermally synthesized compounds.…”
Section: Introductionmentioning
confidence: 99%
“…Among all ZnO nanostructures, ZnO nanowires (ZnO NWs) are of the main interest due to their high aspect ratio (AR), the proportion of length/diameter and is related to the effective surface area. Also, ZnO NWs present effective confinement of photons and carriers (Song et al, 2010 ; Cui, 2012 ), and they provide a direct and fast pathway to the transportation of free charge carriers (Karst et al, 2011 ; Lee et al, 2011 ; Meng et al, 2014 ). These previous properties suggest ZnO NWs as a good candidate for UV laser, photocatalysis, solar cells, LEDs, and other photonic applications (Hong et al, 2008 ; Kang et al, 2008 ; Wijeratne and Bandara, 2014 ; Polyakov et al, 2016 ).…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the choice of a deposition technique for the TiO 2 nanostructure is critical to enable large production volumes, versatility, low energy consumption, and so on . Several deposition techniques were developed, including sol–gel, chemical vapor deposition, , hydrothermal, solvothermal, microwave, electrochemical oxidation, electrospinning, spray pyrolysis, chemical bath, sputtering, atomic layer deposition, oblique electrostatic inkjet, and electrostatic inkjet (EI), to fabricate TiO 2 photoanodes. The commonly used sol–gel technique enables TiO 2 nanostructure production but is limited in large-scale production.…”
Section: Introductionmentioning
confidence: 99%
“…The commonly used sol–gel technique enables TiO 2 nanostructure production but is limited in large-scale production. Chemical vapor deposition (11) and sputtering require a vacuum environment and suffer a slow deposition rate. Scalable bottom-up atomic layer deposition requires relatively long processing times and is rather expensive too.…”
Section: Introductionmentioning
confidence: 99%