“…Therefore, the choice of a deposition technique for the TiO 2 nanostructure is critical to enable large production volumes, versatility, low energy consumption, and so on . Several deposition techniques were developed, including sol–gel, − chemical vapor deposition, , hydrothermal, solvothermal, microwave, electrochemical oxidation, electrospinning, spray pyrolysis, chemical bath, sputtering, atomic layer deposition, oblique electrostatic inkjet, and electrostatic inkjet (EI), to fabricate TiO 2 photoanodes. The commonly used sol–gel technique enables TiO 2 nanostructure production but is limited in large-scale production.…”