“…Therefore growth of non-polar ZnO, A-plane mostly, has been drawing an increasing attention in order to eliminate the influence of the internal electrostatic field on internal quantum efficiency of the LED devices. Significant efforts have been devoted to both heteroepitaxy [12] and homoepitaxy [13,14] of non-polar ZnO on different substrates recently, most of the films exhibit rough surfaces with typical striped structures and it is impossible to apply them to quantum well structures. For these applications, it is essential to improve the surface morphology and make it meet device requirements.…”