2005
DOI: 10.1063/1.2034113
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Growth of high-quality ZnMgO epilayers and ZnO∕ZnMgO quantum well structures by radical-source molecular-beam epitaxy on sapphire

Abstract: We report on a specific growth procedure combining low-temperature growth of ZnMgO and postgrowth annealing at intermediate temperatures. Despite the large lattice misfit induced by the sapphire substrate, layer-by-layer growth is accomplished up to the phase-separation limit found at a c-lattice constant of 0.5136nm and Mg mole fraction of 0.40. The procedure allows us to grow quantum wells with atomically smooth interfaces in a wide range of structural designs exhibiting prominent emission features up to roo… Show more

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Cited by 127 publications
(70 citation statements)
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“…Note that the low T g allows for the growth . A Mg content of x = 0.35 slightly below the solubility limit was selected for the low refractive index (RI) layer [10] in order to reach a large RI contrast (∆n/n ≈ 10%) while still allowing for stable two-dimensional growth. For the specific layer thicknesses used, the stop band is centered at λ SC = 436 nm and exhibits a spectral width of about 180 meV.…”
mentioning
confidence: 99%
“…Note that the low T g allows for the growth . A Mg content of x = 0.35 slightly below the solubility limit was selected for the low refractive index (RI) layer [10] in order to reach a large RI contrast (∆n/n ≈ 10%) while still allowing for stable two-dimensional growth. For the specific layer thicknesses used, the stop band is centered at λ SC = 436 nm and exhibits a spectral width of about 180 meV.…”
mentioning
confidence: 99%
“…with the polar c-direction of ZnO lying in the growth plane. Wide ZnO/(Zn, Mg)Obased QWs without QCSE have been successfully grown on the a-plane (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) [13,22,23] or the m-plane (10-10) [24,25].…”
Section: Introductionmentioning
confidence: 99%
“…ZnO/(Zn,Mg)O QWs have been successfully grown by different techniques such as LMBE [6][7][8][9][10], metalorganic chemical vapor deposition [11,12], and molecular beam epitaxy (MBE) [13][14][15]. Originally sapphire [3] substrates were used.…”
Section: Introductionmentioning
confidence: 99%
“…In order to address high energy ISBT we have chosen a Mg content of x = 0.40, which is close to the solubility limit. 15 As a consequence, the samples exhibit an island-like surface morphology with the average island height of 7 nm and the root mean square roughness of 3.1 nm over a scanning area of 10 × 10 µm 2 .…”
mentioning
confidence: 99%