2021
DOI: 10.1109/tasc.2021.3060366
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Growth of High-Performance 4-5μm Thick Film REBCO Tapes Doped With Hafnium Using Advanced MOCVD

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Cited by 13 publications
(9 citation statements)
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“…© IOP Publishing Ltd. All rights reserved. at 4.2 K, 16 T and 15 mol.% Hf-added tape showed J c > 9 MA cm −2 at 20 K, 9 T [39,46]. As shown in figure 3, the J c and F p levels of 4.6 µm thick Advanced MOCVD tape are even slightly higher than the corresponding levels of 0.9 µm thick MOCVD tape, which indicates the efficacy of the Advanced MOCVD process to fabricate high-quality tapes even with thick films.…”
Section: Low Field High-temperature Rebcomentioning
confidence: 93%
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“…© IOP Publishing Ltd. All rights reserved. at 4.2 K, 16 T and 15 mol.% Hf-added tape showed J c > 9 MA cm −2 at 20 K, 9 T [39,46]. As shown in figure 3, the J c and F p levels of 4.6 µm thick Advanced MOCVD tape are even slightly higher than the corresponding levels of 0.9 µm thick MOCVD tape, which indicates the efficacy of the Advanced MOCVD process to fabricate high-quality tapes even with thick films.…”
Section: Low Field High-temperature Rebcomentioning
confidence: 93%
“…While at that time, the improvement was attributed primarily to the higher level of Zr addition, it has now been found that the Ba content plays the primary role in determining the microstructure of the columnar defects, the accompanying strain and in turn, the in-field performance [38]. Thus, a superior performance can now be achieved even with 5 mol.% Zr addition [38,39].…”
Section: Low Field High-temperature Rebcomentioning
confidence: 99%
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“…However, to simplify the current analysis we only discuss the mechanical effects between the Hastelloy and the superconductor. More details about the synthesis and compositions of the tapes are available in refs , , and .…”
Section: Methodsmentioning
confidence: 99%
“…REBCO films are usually deposited on a biaxially-textured buffer layer either by chemical routes including metalorganic chemical vapor deposition (MOCVD) [5], metal-organic deposition (MOD) [6], or by physical vapor deposition routes including pulsed laser deposition (PLD) [7,8] and reactive co-evaporation (RCE) [9]. University of Houston developed Advanced MOCVD to grow REBCO layer with high critical current density (J c) and film thickness as high as 5 μm in a single pass [10,11]. A critical current (Ic) of 1836 A has been achieved at 4.2 K, 20 T which corresponds to an engineering current density of 4,600 A/cm 2 based on 0.1 mm thick tape [12].…”
Section: Introductionmentioning
confidence: 99%