2006
DOI: 10.1504/ijnt.2006.008725
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Growth of Hg<SUB align=right>1-xCd<SUB align=right>xTe nanostructures by molecular beam epitaxy with ellipsometric control

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Cited by 117 publications
(69 citation statements)
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“…Our samples with HgTe quantum wells were realized on the basis of HgTe/Hg 1−x Cd x Te (x = 0.55 − 0.65) heterostructures grown by molecular beam epitaxy on GaAs substrate with the (013) surface orientation [16]. The samples were mesa etched into standard Hall bars of 0.5 mm width and the distance between the potential probes of 0.5 mm.…”
Section: Methodsmentioning
confidence: 99%
“…Our samples with HgTe quantum wells were realized on the basis of HgTe/Hg 1−x Cd x Te (x = 0.55 − 0.65) heterostructures grown by molecular beam epitaxy on GaAs substrate with the (013) surface orientation [16]. The samples were mesa etched into standard Hall bars of 0.5 mm width and the distance between the potential probes of 0.5 mm.…”
Section: Methodsmentioning
confidence: 99%
“…The details of the structure growth process are described in [8,9]. The QW cross-section and the energy diagram of the structures investigated is shown in Fig.3a and 1b, respectively.…”
Section: Experiments Samplesmentioning
confidence: 99%
“…Rzhanov Institute of Semiconductor Physics (Novosi− birsk, Russia). The details of the growth procedure can be found elsewhere [18]. The growth cycle was carried out without exposing the substrate and buffer layers to ambient atmosphere, and was controlled by means of an automatic ellipsometer.…”
Section: Methodsmentioning
confidence: 99%