1996
DOI: 10.1557/s1092578300001885
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Growth of Ga-face and N-face GaN films using ZnO Substrates

Abstract: We have used plasma molecular beam epitaxy on (0 0 0 1) and (0 0 0 ) ZnO substrates to induce epitaxial growth of GaN of a known polarity. The polarity of the ZnO substrates can be easily and unambiguously determined by measuring the sign of the piezoelectric coefficient. If we assume that N-face GaN grows on O face ZnO and that Ga-face GaN grows on Zn face ZnO, then we can study the growth of both Ga and N faces. The most striking difference is the doping behavior of the two faces. Growth on the Ga-face is ch… Show more

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Cited by 74 publications
(46 citation statements)
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“…ZnO has been regarded as one of the most suitable substrates for epitaxial growth of GaN because it has the same wurtzite structure and the lattice mismatches between GaN and ZnO are only 1.9 and 0.4% for a-axis and c-axis [6]. However, it is difficult to grow high-quality GaN films on ZnO because interfacial layers are formed between GaN and ZnO by metalorganic chemical vapor deposition or molecular beam epitaxy due to their high-growth temperatures [7].…”
mentioning
confidence: 99%
“…ZnO has been regarded as one of the most suitable substrates for epitaxial growth of GaN because it has the same wurtzite structure and the lattice mismatches between GaN and ZnO are only 1.9 and 0.4% for a-axis and c-axis [6]. However, it is difficult to grow high-quality GaN films on ZnO because interfacial layers are formed between GaN and ZnO by metalorganic chemical vapor deposition or molecular beam epitaxy due to their high-growth temperatures [7].…”
mentioning
confidence: 99%
“…Thus far, many materials have been proposed as substrates with small lattice mismatches to GaN. [3][4][5][6][7][8][9][10][11][12][13] Among them, ZnO has been regarded as the most promising substrate because ZnO and GaN perfectly share the same crystalline symmetries and the lattice mismatches between them are 1.9% and 0.4% for the a axis and c axis, respectively.…”
mentioning
confidence: 99%
“…The crystal growth apparatus utilizes a modified Bridgeman growth technique including a pressure vessel that contains pressurized oxygen, Figure 3 (1). The apparatus also includes a cooling unit (2) that is situated in the pressure vessel. The cooling unit receives a coolant flow from outside of the vessel (3) and has cooled surfaces that define an enclosure, which receives the ZnO with proper dopant concentration (10 15 -10 20 atoms / cc ).…”
Section: Melt Growth Processmentioning
confidence: 99%