2005
DOI: 10.1016/j.tsf.2005.04.063
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Growth of Fe2O3 thin films by atomic layer deposition

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Cited by 107 publications
(95 citation statements)
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“…␣-Fe 2 O 3 thin films were grown using chemical vapor deposition technique with the source material of Fe(CO) 5 [11]. It was observed that ␣-Fe 2 O 3 phase was more stable in the low temperature range, while Fe 3 O 4 phase was observed above 120 • C. Lie et al [12] have utilized atomic layer deposition technique for deposition of Fe 2 O 3 thin films with Fe(thd) 3 (iron derivative of thd = 2,2,6,6-tetramethylheptane-3,5-dione) and ozone as precursors. Gich et al [13] netic multilayers thin films based on ZnO and Fe 3 O 4 using PLD [14].…”
Section: Introductionmentioning
confidence: 99%
“…␣-Fe 2 O 3 thin films were grown using chemical vapor deposition technique with the source material of Fe(CO) 5 [11]. It was observed that ␣-Fe 2 O 3 phase was more stable in the low temperature range, while Fe 3 O 4 phase was observed above 120 • C. Lie et al [12] have utilized atomic layer deposition technique for deposition of Fe 2 O 3 thin films with Fe(thd) 3 (iron derivative of thd = 2,2,6,6-tetramethylheptane-3,5-dione) and ozone as precursors. Gich et al [13] netic multilayers thin films based on ZnO and Fe 3 O 4 using PLD [14].…”
Section: Introductionmentioning
confidence: 99%
“…A variety of different methods has been used to deposit iron oxide thin films, e.g., sputtering, [4] sol-gel, [5] aqueous chemical growth, [3] molecular beam epitaxy (MBE), [8] CVD, [9,10] and ALD. [11][12][13][14] There are also numerous reports of nanostructured iron oxide. [3,[15][16][17][18] Despite all reports of nanostructured materials, it is inherently difficult to fabricate arrays in a well-ordered pattern.…”
Section: Introductionmentioning
confidence: 99%
“…Additionally, oxygen evolution catalysts 22,23 and passivation layers 24,25 are employed to decrease the overpotential of the multistep 4e À oxygen evolution reaction which is inherently sluggish on hematite photoelectrodes. Hematite photoanodes can be prepared following several strategies such as sol-gel methods, 26 spray pyrolysis 27,28 chemical vapour deposition (CVD) 15,29 sputtering, 19 atomic layer deposition (ALD) 30,31 and electrodeposition (ED). [32][33][34] ED presents numerous attractive features over the other techniques such as the use of non-toxic iron precursors, simple instrumentation, high exibility in terms of composition and experimental parameters, and easy scale up for the fabrication of large area electrodes.…”
mentioning
confidence: 99%