2006
DOI: 10.1016/j.tsf.2006.07.142
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Growth of epitaxial Cu on MgO(001) by magnetron sputter deposition

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Cited by 43 publications
(25 citation statements)
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“…films, observed previously at UHV conditions,[24] is reproduced here at lower-vacuum conditions. The epitaxial relation corroborates with the above-mentioned calculation results showing that the easy axes of the bcc Fe(in-plane magnetic anisotropy value K eff ¼ K P 1 determined in this work can be compared to the results of previous experiments on the Fe(1 1 0)/Cu(0 0 1) samples prepared under UHV conditions.…”
supporting
confidence: 81%
“…films, observed previously at UHV conditions,[24] is reproduced here at lower-vacuum conditions. The epitaxial relation corroborates with the above-mentioned calculation results showing that the easy axes of the bcc Fe(in-plane magnetic anisotropy value K eff ¼ K P 1 determined in this work can be compared to the results of previous experiments on the Fe(1 1 0)/Cu(0 0 1) samples prepared under UHV conditions.…”
supporting
confidence: 81%
“…These columns with circular cross-sections were milled into bulk single crystals and in a 1 m thick epitaxial Cu film on (1 0 0) oriented MgO grown with a cube-on-cube orientation relationship [32], an example is shown in Fig. 1c.…”
Section: Methodsmentioning
confidence: 99%
“…The NbC x N 1−x films were deposited in a load-locked multichamber ultrahigh vacuum DC dual magnetron sputter deposition system with a base pressure of 10 − 9 Torr (1.3 × 10 −7 Pa) [47], onto one-side polished 10 × 10 × 0.5 mm 3 MgO(001) wafers that were ultrasonically cleaned in subsequent baths of trichloroethylene, acetone and isopropyl alcohol, rinsed in de-ionized water, blown dry with dry nitrogen, mounted onto a substrate holder using silver paint, inserted into the deposition system, and degassed for 1 h at 1000°C using a radiative pyrolytic graphite heater [48]. The heater current was adjusted to reach the desired substrate temperature T s = 600, 700, 800, 900 and 1000°C, as measured with a pyrometer that was cross-calibrated by a thermo couple underneath the substrate holder.…”
Section: Experimental and Computational Proceduresmentioning
confidence: 99%