1997
DOI: 10.1016/s0927-0248(97)00068-8
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Growth of CuInS2 films by rf ion plating and their characterization

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Cited by 20 publications
(6 citation statements)
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“…3), show a strong diffraction peak at 27.8 corresponding to a preferential (112) orientation of crystalline chalcopyrite CuInS 2 phase, in good agreement with the literature. This preferential orientation has been noticed in numerous CuInS 2 thin films prepared by different techniques [8,16]. This remarkable result was obtained without any substrate heating during deposition [7], post-annealing or chemical treatments with KCN [8].…”
Section: Structurementioning
confidence: 51%
“…3), show a strong diffraction peak at 27.8 corresponding to a preferential (112) orientation of crystalline chalcopyrite CuInS 2 phase, in good agreement with the literature. This preferential orientation has been noticed in numerous CuInS 2 thin films prepared by different techniques [8,16]. This remarkable result was obtained without any substrate heating during deposition [7], post-annealing or chemical treatments with KCN [8].…”
Section: Structurementioning
confidence: 51%
“…This material possesses several advantages over CuInSe 2 , namely a band gap energy (1.5 eV) that closely matches the visible part of the solar spectrum, a higher absorption coefficient (10 5 cm À1 ) and a lower toxicity. CuInS 2 thin films had been studied intensively by physical and chemical methods, such as co-evaporation [6], molecular beam deposition [7], ion plating [8], chemical vapour deposition [9], spray pyrolysis [10], chemical bath deposition [11], electro-deposition [12]. However, these methods are usually complex and expensive due to rigorous synthetic conditions such as the need for a high vacuum and temperature.…”
Section: Introductionmentioning
confidence: 99%
“…2) shows crystalline chalcopyrite CuInS 2 phase with a preferential (112) orientation, corresponding to the 27.8 diffraction peak, in agreement with literature. 28,29 Grazing angle diffractograms of anodized samples show no differences compared to as-deposited films. Within detection limits of XRD and EDX, no change of surface composition is observed.…”
Section: B Structurementioning
confidence: 98%