2017
DOI: 10.1007/s10853-017-1902-z
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Growth of (111)-oriented epitaxial magnesium silicide (Mg2Si) films on (001) Al2O3 substrates by RF magnetron sputtering and their properties

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Cited by 10 publications
(7 citation statements)
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“…This conclusion is consistent with other experimental results 19–21 . The p‐type origin of Mg 2 Si was related to Mg vacancy, the absence of the interstitial Mg or extrinsic defects such as interstitia O atoms introduced during the post annealing 22 …”
Section: Resultssupporting
confidence: 92%
“…This conclusion is consistent with other experimental results 19–21 . The p‐type origin of Mg 2 Si was related to Mg vacancy, the absence of the interstitial Mg or extrinsic defects such as interstitia O atoms introduced during the post annealing 22 …”
Section: Resultssupporting
confidence: 92%
“…Accordingly, the Mg vacancies increase, which acts as hole dopants making the acceptor level slightly above the top of the valence band. In the case of Mg 2 Si undoped thin film, the p-type behavior also was reported by A. Katagiri and S. Ohgawa et al 41,42) In their papers, they suggest that the absence of the interstitial Mg, but they do not clarify which defects are responsible for the strong p-type behavior. Our paper suggests that Mg vacancies (point defects) can explain the p-type behavior and the improvement of thermoelectric properties in the case of Mg-based undoped thin films.…”
Section: Thermoelectric Propertymentioning
confidence: 82%
“…When fixing SPE temperature slightly above 300 o C, which is favorable for magnetron sputtering and thermal evaporation of Mg 2 Si films on Si substrates 26,[44][45][46] , At the second stage, effect of the SPE temperature on the average reflectivity of the Mg 2 Si/b-Si was examined for the fixed 50-nm thick Mg film thickness determined previously as optimal. The data are summarized in Fig.…”
Section: Resultsmentioning
confidence: 99%