1981
DOI: 10.1149/1.2127358
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Growth Mechanisms of Silicon Crystallites Grown on Top of a Metal‐Coated Graphite Substrate

Abstract: Microscopic in situ observations.and a posteriori surface topography by means of optical and scanning electron microscopy have been carried out in order to study the growth of large-grain polycrystalline silicon films from the gas phase onto a graphite substrate coated with a liquid layer of tin or aluminum. In the present study, only the initial stages of the process, where crystal growth is governed by vapor-liquid-solid mechanisms, are considered. For the growth of the crystallites in the polycrystalline la… Show more

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Cited by 15 publications
(5 citation statements)
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“…Further, no re-entrant corner was observed at the needle tips, which excludes enhanced growth by the twin plane re-entrant edge (TPRE) mechanism. 24 26 Further, neither in situ microscopic nor X-ray evidence was found for recrystallization from an unknown metastable form of NaCl to cubic fcc NaCl. Finally, morphological instability does not fully explain the development of the needles as follows from the fact that the needles often do not show a preferred direction of growth induced by a gradient in supersaturation, but are crisscrossed.…”
Section: Mechanism Of Needle Formationmentioning
confidence: 98%
“…Further, no re-entrant corner was observed at the needle tips, which excludes enhanced growth by the twin plane re-entrant edge (TPRE) mechanism. 24 26 Further, neither in situ microscopic nor X-ray evidence was found for recrystallization from an unknown metastable form of NaCl to cubic fcc NaCl. Finally, morphological instability does not fully explain the development of the needles as follows from the fact that the needles often do not show a preferred direction of growth induced by a gradient in supersaturation, but are crisscrossed.…”
Section: Mechanism Of Needle Formationmentioning
confidence: 98%
“…The enhanced growth of the twinned diamond structure is likely explained by the twin plane reentrant edge (TPRE) mechanism. New growth layers are preferentially nucleated at a reentrant corner on the nanowire side facets, which corresponds to a twin plane outcrop. …”
mentioning
confidence: 99%
“…An aluminum impurity deposited to a thickness of less than 8 A on a silicon surface was detected with a photo I-V technique (241). SEM has been used to study the growth of large-grain polycrystalline silicon films from the gas phase; two different formation mechanisms could be identified: a twin plane reentrant edge mechanism and a nucleation mechanism (940). Films of single crystal cobalt silicide on Si(lll) were analyzed by RBS, TEM, and LEED with the observation that the films are free of grain boundaries (924).…”
Section: Semiconductorsmentioning
confidence: 99%