2010
DOI: 10.1021/nl1022699
|View full text |Cite
|
Sign up to set email alerts
|

Growth Mechanism of Self-Catalyzed Group III−V Nanowires

Abstract: Group III−V nanowires offer the exciting possibility of epitaxial growth on a wide variety of substrates, most importantly silicon. To ensure compatibility with Si technology, catalyst-free growth schemes are of particular relevance, to avoid impurities from the catalysts. While this type of growth is well-documented and some aspects are described, no detailed understanding of the nucleation and the growth mechanism has been developed. By combining a series of growth experiments using metal−organic vapor phase… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

10
221
2

Year Published

2015
2015
2024
2024

Publication Types

Select...
7
3

Relationship

0
10

Authors

Journals

citations
Cited by 185 publications
(233 citation statements)
references
References 41 publications
10
221
2
Order By: Relevance
“…33 Our measurements support particle-assisted growth scheme with seed particles containing elements constituting the NW because the measured NW length and diameter increase with an increase in Ga droplet size (Fig. 1).…”
Section: Resultssupporting
confidence: 74%
“…33 Our measurements support particle-assisted growth scheme with seed particles containing elements constituting the NW because the measured NW length and diameter increase with an increase in Ga droplet size (Fig. 1).…”
Section: Resultssupporting
confidence: 74%
“…This important feature requires a careful investigation of time-dependent nucleation of nanowires and nanowire statistics, a problem that, to the best of our knowledge, has not been addressed so far. On the other hand, self-catalyzed III-V nanowires usually grow not only vertically, but also extend radially [30,31]. This is due to an excessive group III influx into the reservoir in the Ga droplet.…”
Section: The Modelmentioning
confidence: 99%
“…17 Meanwhile, the density of the InAs nanorods depended on both molecular fluxes and growth temperature, as these factors strongly affect the surface migration lengths of adatoms. 17,18 RHEED characterization In this study, MBE-grown InAs nanorods on CVD graphene layers were monitored in situ in the initial growth stage using RHEED. Before the nanorod growth, as shown in Figure 2a, a streaky RHEED pattern was observed from CVD graphene layers transferred onto a SiO 2 /Si substrate.…”
Section: Resultsmentioning
confidence: 99%