Growth, characterization and micro-pattern fabrication of iridium/Si3N4/Si(100) thin films

Abstract

Iridium thin films have been deposited on Si 3 N 4 (100 nm)/Si(100) substrates by magnetron sputtering. And then iridium film micro-patterns were fabricated by ion milling technique. The atomic force microscopy (AFM) measurements reveal that there is a very flat and smooth surface with an average roughness of 0.64 nm for the iridium films. The X-ray diffraction also reveals that the deposited iridium films have a polycrystalline microstructure with (111) plane preferential orientation. The electrical resistivity of the iridium films was also measured and discussed.