1990
DOI: 10.1063/1.104265
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Growth characteristics of silicon dioxide produced by rapid thermal oxidation processes

Abstract: Silicon dioxide growth curves produced by a rapid thermal processor were analyzed. No break point was observed in the growth curves. Of the kinematical models being compared, the linear-parabolic equation gave the best fit. However, the coefficients of the equation are thickness dependent as in the case of diffusion furnace oxide growth data. The correlation in the growth curves indicated similar oxide growth kinematics for the two types of oxidation equipment. Under certain oxidation conditions, the coefficie… Show more

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Cited by 24 publications
(11 citation statements)
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“…This process can take place at relatively high temperatures (900-1100°C) for well controlled short periods of time. Y. L. Chiouet al [12,27]obtained the ultra-thin silicon oxide films with good performance by rapid thermal oxidation, and they also analyzed the growth characteristics of silicon oxide.…”
Section: Thermal Oxidation Methodsmentioning
confidence: 99%
“…This process can take place at relatively high temperatures (900-1100°C) for well controlled short periods of time. Y. L. Chiouet al [12,27]obtained the ultra-thin silicon oxide films with good performance by rapid thermal oxidation, and they also analyzed the growth characteristics of silicon oxide.…”
Section: Thermal Oxidation Methodsmentioning
confidence: 99%
“…This process of precipitation requires large amount of chromium and hence the chromium from the adjacent region diffuse resulting in the formation of chromium-depleted zone. This zone is anodic to the unaffected grains and consequently becomes a preferential site for corrosion attack or crack propagation under tensile stress.Presently various coating techniques such as oxidation of an evaporated metal film [5,6], reactive and non-reactive sputtering techniques [7], chemical vapor deposition [8], physical vapour deposition [9] and sol-gel coating [10] are employed to fabricate surface protective coatings for ferrous and non-ferrous alloys. Nevertheless, fabrication of nanocomposite coatings with required proportion of nanostructures like nanoparticles and nanorods of other elements by the above…”
mentioning
confidence: 99%
“…As superfícies planares de SiO 2 foram obtidas por oxidação térmica rápida de lâminas de silício monocristalino [Chiou, et al, 1990] A tabela II.4.2 mostra a planilha de cálculo utilizada para calcular a quantidade de moléculas de fosfolipídio adsorvida por metro quadrado de sílica.…”
Section: -Obtenção Das Superfícies Planares De Si0unclassified