2016
DOI: 10.1016/j.actamat.2016.07.006
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Growth and thermal stability of TiN/ZrAlN: Effect of internal interfaces

Abstract: Wear resistant hard films comprised of cubic transition metal nitride (c-TMN) and metastable c-AlN with coherent interfaces have a confined operating envelope governed by the limited thermal stability of metastable phases. However, equilibrium phases (c-TMN and wurtzite(w)-AlN) forming semicoherent interfaces during film growth offer higher thermal stability. We demonstrate this concept for a model multilayer system with TiN and ZrAlN layers where the latter is a nanocomposite of ZrN- and AlN- rich domains. Th… Show more

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Cited by 50 publications
(20 citation statements)
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References 61 publications
(83 reference statements)
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“…Similar morphology and electron diffraction as of x = 0.75 was recorded for Zr 0.43 Al 0.57 N film deposited at 700 °C in identical conditions as are used in this work (see Fig. 3 in 30 ). Combining this information with present XRD analysis, we assume that for x > 0.55 films exhibit identical wurtzite nanocomposite morphology with varying d-spacing depending on Al content.…”
Section: Resultssupporting
confidence: 67%
See 1 more Smart Citation
“…Similar morphology and electron diffraction as of x = 0.75 was recorded for Zr 0.43 Al 0.57 N film deposited at 700 °C in identical conditions as are used in this work (see Fig. 3 in 30 ). Combining this information with present XRD analysis, we assume that for x > 0.55 films exhibit identical wurtzite nanocomposite morphology with varying d-spacing depending on Al content.…”
Section: Resultssupporting
confidence: 67%
“…Experimental findings of w-ZrAlN in this work is an important result as it opens the possibility of formation of metastable zincblende/wurtzite structures of ZrN with group-IIIA–N alloys, in particular Zr 1− x In x N alloys, as the interatomic distances of ZrN and InN in the zincblende and wurtzite structures are very close 45 . Moreover, further understanding of electronic structure of w-Zr 1− x In x N will also help to underline the mechanisms behind alleged slow diffusion in these films which has direct impact on extreme thermal stability and mechanical integrity during high-temperature operations 13 , 30 , 46 .…”
Section: Discussionmentioning
confidence: 99%
“…In addition, the thermal stability of the interfaces could also play an important role here since the c-111||w-0001 type of interfaces has been calculated as the lowest total energy compared with isostructural and heterostructural interfaces for both TiN/AlN and ZrN/AlN multilayer systems [45]. The heterogeneous nature of the Ti(Zr)N-sublayers is expected to cause areas where the coherency is lost during annealing resulting in a lower degree of coherency compared to the as-deposited state.…”
Section: Microstructure and Strain Evolution During Annealingmentioning
confidence: 99%
“…With increasing Al content, the Zr1-xAlxN solid solution (x=0, 0.12, 0.26) gradually transforms to a nanocomposite (x=0.4-0.55) with a characteristic two-phase laminated structure described in ref. [24].…”
Section: Thin Film Synthesismentioning
confidence: 99%