2018
DOI: 10.1016/j.jcrysgro.2018.03.036
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Growth and optical characteristics of InAs quantum dot structures with tunnel injection quantum wells for 1.55 μm high-speed lasers

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Cited by 9 publications
(2 citation statements)
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“…We analyze an InAs/InP TI QD SOA operating at 1.55 µm whose epitaxial structure and dimenssions are described in [21]. A hybrid state that couples the first excited state of the QD and the bottom of the IW continuum of states [14] ensures a fast carrier capture with a typical time constant of about 1 ps.…”
Section: Simulation Pump-probe Model Of the Ti-qd Soamentioning
confidence: 99%
“…We analyze an InAs/InP TI QD SOA operating at 1.55 µm whose epitaxial structure and dimenssions are described in [21]. A hybrid state that couples the first excited state of the QD and the bottom of the IW continuum of states [14] ensures a fast carrier capture with a typical time constant of about 1 ps.…”
Section: Simulation Pump-probe Model Of the Ti-qd Soamentioning
confidence: 99%
“…22 To benefit from the advantages of the TI design in telecommunication applications, InAs QDs within an InGaAlAs barrier lattice matched to the InP substrate are attractive due to their emission around the 1.55 µm wavelength and their re-duced size inhomogeneity. 8,[23][24][25][26][27][28] Further investigations of the InAs/InP material system include studies of the behavior of the QD ground state under the influence of varying QW parameters, as well as the carrier dynamics in TI structures at cryogenic temperatures. 28,29 For the simulation of carrier and laser dynamics in TI laser devices, the tunneling process is often described via rate equations, [30][31][32][33][34] using time constants extracted from experiments.…”
Section: Introductionmentioning
confidence: 99%