Growth and characterization of nanocrystalline SrTiOxfilms: room temperature deposition using RF sputtering system in a pure argon environment

Bayrak, Türkan; Goldenberg, Eda

doi:10.1088/2053-1591/aa6df3

Cited by 3 publications

(3 citation statements)

References 38 publications

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“…Conversely, as-deposited films revealed a lower areal capacitance of (104 nF/cm 2 ) with a lower dielectric constant of 13, compared to the other samples. Preforming the dual voltage sweep of (C-V), through the range of (-20) V to (+9) V, showed a shift towards a positive bias suggesting the presence of positively charged traps and/or a lattice mismatch between the silicon/STO interface [27]. There is usually a strong coupling of lattice strain to polarization which, in sequence, affects the ferroelectric properties of dielectric films and, hence, their hysteresis voltages [28].…”

Section: Resultsmentioning

confidence: 99%

Impact of Deep Ultraviolet-Ozone Photoactivation on Dielectric Properties of Amorphous SrTiO3 Thin Films

Mudhaffar

Al-Jawhari

2022

KEM

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Strontium titanate SrTiO3 thin films have been fabricated by radio frequency magnetron sputtering on P-type Si at substrate temperature of 200°C. Two different postdeposition annealing methods were applied on the sputtered films. Specifically, conventional thermal annealing at 300°C for 60 min and photoactivation treatment under deep ultraviolet-ozone for 30 min. The dielectric properties of the SrTiO3 thin films were investigated by fabricating Au/STO/p-Si MOS capacitors. A dielectric constant (κ) with a value of 13 was obtained for as-deposited film, which has a thickness of 107 nm. While post-annealed samples showed elevated values of κ, precisely, 15.33 and 19.32 for films exposed to deep ultraviolet-ozone photoactivation and films annealed at 300°C, respectively. All devices showed a leakage current in the order of 10-8 A/cm2 at 1V. Based on XPS analysis, photo-activated films revealed the lowest percentage of oxygen vacancies, which designates the capability of this technique to enhancing films quality at a lower temperature.

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Section: Resultsmentioning

confidence: 99%

Impact of Deep Ultraviolet-Ozone Photoactivation on Dielectric Properties of Amorphous SrTiO3 Thin Films

Mudhaffar

Al-Jawhari

2022

KEM

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“…However, high deposition temperature is a major limitation associated with the commercialization of these materials. Therefore, low‐temperature growth, and understanding its structural‐properties relationship are of significant contribution to the field 15,16 …”

Section: Introductionmentioning

confidence: 99%

“…Therefore, low-temperature growth, and understanding its structural-properties relationship are of significant contribution to the field. 15,16 SrTiO 3 thin films have been deposited on variety of substrates, depending on the application. For example, the integration of STO thin films with Si substrates is highly desirable for CMOS-applications.…”

Section: Introductionmentioning

confidence: 99%

Electro‐optical performances of nanostructured SrTiO_x films: The effect of plasma power, Ar/O₂ ratio and annealing

Goldenberg

Bayrak

Mohammadmoradi

2021

Int J Applied Ceramic Tech

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The present work evaluates the effects of plasma power and oxygen mixing ratios (OMRs) on structural, morphological, optical, and electrical properties of strontium titanate SrTiOx (STO) thin films. STO thin films were grown by magnetron sputtering, and later thermal annealing at 700°C for 1 h was applied to improve film properties. X‐ray diffraction analysis indicated that as‐deposited films have amorphous microstructure independent of deposition conditions. The films deposited at higher OMR values and later annealed also showed amorphous structure while the films deposited at lower OMR value and annealed have nanocrystallinity. In addition, all as‐deposited films were highly transparent (~80%–85%) in the visible spectrum and exhibited well‐defined main absorption edge, while the annealing improved transparency (90%) within the same spectrum. The calculated direct and indirect optical band gaps for films were in the range of 3.60‐4.30 eV as a function of deposition conditions. The refractive index of the films increased with OMRs and the postdeposition annealing. The frequency dependent capacitance measurements at 100 kHz were performed to obtain film dielectric constant values. High dielectric constant values reaching up to 100 were obtained. All STO samples exhibited more than 2.5 μC/cm2 charge storage capacity and low dielectric loss (less than 0.07 at 100 kHz). The leakage current density was relatively low (3 × 10−8Acm−2 at +0.8 V) indicating that STO films are promising for future dynamic random access memory applications.

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The effect of rare earth ions on structural, morphological and thermoelectric properties of nanostructured tin oxide based perovskite materials

Rajasekaran¹,

Nedunchezhian²,

Devi³

et al. 2017

Mater. Res. Express

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Growth and characterization of nanocrystalline SrTiO_xfilms: room temperature deposition using RF sputtering system in a pure argon environment

Cited by 3 publications

References 38 publications

Impact of Deep Ultraviolet-Ozone Photoactivation on Dielectric Properties of Amorphous SrTiO<sub>3</sub> Thin Films

Impact of Deep Ultraviolet-Ozone Photoactivation on Dielectric Properties of Amorphous SrTiO<sub>3</sub> Thin Films

Electro‐optical performances of nanostructured SrTiO_x films: The effect of plasma power, Ar/O₂ ratio and annealing

The effect of rare earth ions on structural, morphological and thermoelectric properties of nanostructured tin oxide based perovskite materials

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Growth and characterization of nanocrystalline SrTiOxfilms: room temperature deposition using RF sputtering system in a pure argon environment

Cited by 3 publications

References 38 publications

Impact of Deep Ultraviolet-Ozone Photoactivation on Dielectric Properties of Amorphous SrTiO<sub>3</sub> Thin Films

Impact of Deep Ultraviolet-Ozone Photoactivation on Dielectric Properties of Amorphous SrTiO<sub>3</sub> Thin Films

Electro‐optical performances of nanostructured SrTiOx films: The effect of plasma power, Ar/O2 ratio and annealing

The effect of rare earth ions on structural, morphological and thermoelectric properties of nanostructured tin oxide based perovskite materials

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Growth and characterization of nanocrystalline SrTiO_xfilms: room temperature deposition using RF sputtering system in a pure argon environment

Electro‐optical performances of nanostructured SrTiO_x films: The effect of plasma power, Ar/O₂ ratio and annealing