2007
DOI: 10.1557/proc-1017-dd13-11
|View full text |Cite
|
Sign up to set email alerts
|

Growth and Characterization of InAs Quantum Dot Enhanced Photovoltaic Devices

Abstract: The growth of InAs quantum dots (QDs) by organometallic vapor phase epitaxy (OMVPE) for use in GaAs based photovoltaics devices was investigated. Growth of InAs quantum dots was optimized according to their morphology and photoluminescence using growth temperature and V/III ratio. The optimized InAs QDs had sizes near 7×40 nm with a dot density of 5(±0.5)×1010 cm-2. These optimized QDs were incorporated into GaAs based p-i-n solar cell structures. Cells with single and multiple (5x) layers of QDs were embed… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
12
0

Year Published

2008
2008
2017
2017

Publication Types

Select...
6
2
1

Relationship

0
9

Authors

Journals

citations
Cited by 22 publications
(12 citation statements)
references
References 9 publications
0
12
0
Order By: Relevance
“…During growth of GaAs/GaPAs SPSs, the temperature was alternated periodically between 575 • C for GaPAs (barrier) layers (36 s/layer) and 475 • C for GaAs (well) layers (40 s/layer). Following the method of Hubbard et al, 28 the lower well-layer temperature was used to enhance nanostructure formation. The targeted growth rate was switched between 5.8 nm/min for the barrier layers and 1.7 nm/min for the well layers.…”
Section: Methodsmentioning
confidence: 99%
“…During growth of GaAs/GaPAs SPSs, the temperature was alternated periodically between 575 • C for GaPAs (barrier) layers (36 s/layer) and 475 • C for GaAs (well) layers (40 s/layer). Following the method of Hubbard et al, 28 the lower well-layer temperature was used to enhance nanostructure formation. The targeted growth rate was switched between 5.8 nm/min for the barrier layers and 1.7 nm/min for the well layers.…”
Section: Methodsmentioning
confidence: 99%
“…Based on the spontaneous emission model, Figures 8 and 9 display the electroluminescence of the p-i-n device due to varying thicknesses of the InAs wells. The literature indicates an electroluminescence of ∼1050 nm for 6 nm quantum dots [11]. In this paper, we have presented a few modeling solutions necessary for the analysis of the next generation of PV devices.…”
Section: Simulation Of the Electroluminescencementioning
confidence: 99%
“…(ii) Following the placement of InAs quantum wells in the i-layer of a GaAs p-i-n cell, there are analysed the quantum confined regions and determined the properties of the eigenstates located therein. (iii) The electroluminescence that occurs due to the nanostructured regions is simulated and discussed [16]. [23].…”
Section: Tablementioning
confidence: 99%