Abstract:TeO2–V2O5–NiO thin films were deposited using thermal evaporation from 40TeO2–([Formula: see text])V2O5–yNiO ([Formula: see text]–30[Formula: see text]mol%) target. Structural analysis of the films was identified by X-ray diffractometry (XRD) and scanning electron microscopy (SEM). The amorphous TeO2–V2O5–NiO films have nanosized clear grain structure and sharp grain boundaries. DC conductivity and current–voltage (I–V) characteristic of TeO2–V2O5–NiO thin films were measured in the temperature range of 300–42… Show more
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