2016
DOI: 10.1109/tsm.2016.2533159
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Growing Structure Multiple Model System for Quality Estimation in Manufacturing Processes

Abstract: A new Virtual Metrology (VM) method for estimation of product quality characteristics will be presented using the recently introduced Growing Structure Multiple Model System (GSMMS) approach for modeling of non-linear dynamic systems. The underlying concept of local linear models enables representation of non-linear dependencies with non-Gaussian and non-stationary noise characteristics. In addition, localized analysis of VM inputs within the GSMMS framework enables detection of situations when the model is no… Show more

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Cited by 12 publications
(4 citation statements)
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“…The system-based monitoring paradigm has seen numerous successful applications in the recent years, including monitoring of automotive engine systems (Cholette & Djurdjanovic, 2012), semiconductor manufacturing tools (Bleakie & Djurdjanovic, 2016), and human muscle performance (Musselman, Gates, &Djurdjanovic, 2017 andMadden, Djurdjanovic, &Deshpande, 2021). This methodology's success can be attributed to its ability to capture not only the anomalies in the input and output signals emitted by a system, but also any anomalous relationships between the inputs and outputs.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The system-based monitoring paradigm has seen numerous successful applications in the recent years, including monitoring of automotive engine systems (Cholette & Djurdjanovic, 2012), semiconductor manufacturing tools (Bleakie & Djurdjanovic, 2016), and human muscle performance (Musselman, Gates, &Djurdjanovic, 2017 andMadden, Djurdjanovic, &Deshpande, 2021). This methodology's success can be attributed to its ability to capture not only the anomalies in the input and output signals emitted by a system, but also any anomalous relationships between the inputs and outputs.…”
Section: Methodsmentioning
confidence: 99%
“…This methodology's success can be attributed to its ability to capture not only the anomalies in the input and output signals emitted by a system, but also any anomalous relationships between the inputs and outputs. By modeling the dynamic relationship between the entity's inputs and outputs, one can analyze how this relationship changes over time, as well as adapt said dynamic model to ensure accurate prediction capabilities, as seen in Bleakie and Djurdjanovic (2016).…”
Section: Methodsmentioning
confidence: 99%
“…To capture the degradation behavior of PECVD, hidden Markov models, whose hidden states represent the unobservable degradation states of the monitored system and whose observable symbols represent the sensor readings, were applied. [175][176][177][178] Ito et al reported the investigation of virtual metrology for predicting the etch rates of blanket films of TEOS-plasma-deposited SiO 2 in a dielectric etcher. Virtual metrology models were created using a training data set with measurements from an RF sensor.…”
Section: Advanced Process Controlmentioning
confidence: 99%
“…For instance, as early as in 1992, they have been explored for parameter estimation in plasma etching based on optical emission spectroscopy (OES) and mass spectroscopy 13 , 14 or global process parameters paired with measured etch characteristics 15 . Plasma virtual metrology (VM) was conducted based on multivariate sensor data, 16 with regard to real-time fault detection in reactive ion etching, 17 batch process characterization in semiconductor fabrication, 18 and a deep learning VM framework based on OES data 19 and “plasma information” descriptors 20 . Further examples have devised an inverse reconstruction of intrinsic plasma properties, such as the electron energy distribution function from OES diagnostics data 21 as well as an active learning guided scheme based on Fourier transform infrared spectroscopy data for parameter space exploration 22 …”
Section: Introductionmentioning
confidence: 99%