2019
DOI: 10.1364/oe.27.0a1458
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Greatly enhanced performance of AlGaN-based deep ultraviolet light emitting diodes by introducing a polarization modulated electron blocking layer

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Cited by 20 publications
(8 citation statements)
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“…A full-thickness excisional wound was created on dorsal skin using a 7-mm punch biopsy without damaging the underlying muscles, as we previously described. 3 , 24 , 45 For topical delivery of miR inhibitors, anti-miR miRNA inhibitor (Thermo Fisher Scientific), 100 nM miRNA inhibitor in Lipofectamine™ RNAiMAX (Invitrogen) in 50 μL of Opti-MEM were topically placed onto the wound bed immediately after punch. The grouping was as follows: (1) db/db wound with 100 nM scrambled control (anti-miR negative control #1, Ambion); (2) db/db wound with 100 nM miR-200b inhibitor (50 nM hsa-miR-200-5p and 50 nM hsa-miR-200-3p, Ambion); (3) db/db wound with 50 nM miR-466a inhibitor (25 nM mmu-miR-466-5p and 25 nM mmu-miR-466-3p, Ambion) and 50 nM of miR-200b inhibitor on days 0, 2, and 4, followed by 100 nM miR-200b inhibitor for the remaining days; and (4) db/+ wound with 100 nM scramble control.…”
Section: Methodsmentioning
confidence: 99%
“…A full-thickness excisional wound was created on dorsal skin using a 7-mm punch biopsy without damaging the underlying muscles, as we previously described. 3 , 24 , 45 For topical delivery of miR inhibitors, anti-miR miRNA inhibitor (Thermo Fisher Scientific), 100 nM miRNA inhibitor in Lipofectamine™ RNAiMAX (Invitrogen) in 50 μL of Opti-MEM were topically placed onto the wound bed immediately after punch. The grouping was as follows: (1) db/db wound with 100 nM scrambled control (anti-miR negative control #1, Ambion); (2) db/db wound with 100 nM miR-200b inhibitor (50 nM hsa-miR-200-5p and 50 nM hsa-miR-200-3p, Ambion); (3) db/db wound with 50 nM miR-466a inhibitor (25 nM mmu-miR-466-5p and 25 nM mmu-miR-466-3p, Ambion) and 50 nM of miR-200b inhibitor on days 0, 2, and 4, followed by 100 nM miR-200b inhibitor for the remaining days; and (4) db/+ wound with 100 nM scramble control.…”
Section: Methodsmentioning
confidence: 99%
“…A similar structure was designed by the team of Ge Weikun of Beijing University as a multilayer electron barrier layer with gradual changes in thickness and Al composition. While suppressing the overflow of electrons, it also increased the emissivity of holes and greatly improved quantum efficiency [69]. Meanwhile, Hu et al reported that an electron deceleration layer with a superlattice structure can be added between the n-type layer and the active region to alleviate the electron overflow effect [70].…”
Section: Carrier Transport and Internal Quantum Efficiencymentioning
confidence: 99%
“…In 2017 and 2018, Zhang et al modified the barrier height for EBL by utilizing p -Al 0.60 Ga 0.40 N (L2)/Al 0.50 Ga 0.50 N/ p -Al 0.60 Ga 0.40 N (L1) EBL and grading the alloy composition respectively, to guarantees a smooth hole injection into the active region 166 , 167 . In 2019, Lang et al adopted an Al-composition and thickness-graded multiple quantum barriers structure as polarization-modulated EBL to enhance the carrier transport in DUV LED 168 . Furthermore, hole reservoir layers with different structures, such as graded AlGaN SLs 169 , Al-composition-graded layer 112 , and inverted-V-shaped quantum barrier 170 , showed significant suppression in the efficiency droop of DUV LEDs.…”
Section: Manipulation Of Polarization Fieldsmentioning
confidence: 99%