2022
DOI: 10.1016/j.apsusc.2021.152108
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Graphene as a diffusion barrier at the interface of Liquid–State low-melting Sn–58Bi alloy and copper foil

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Cited by 20 publications
(8 citation statements)
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“…As a result, various signal integrity (SI) and power integrity (PI) issues can arise. In particular, when the noise couples to vertical interconnects such as through glass vias (TGVs), the SI/PI can be degraded even more at solder joints and micro-bumps [17,18] underneath TGVs due to dimensional mismatches. Various types of noise sources that can cause power/ground noise in the glass interposer PDN are depicted in Figure 2.…”
Section: Figurementioning
confidence: 99%
“…As a result, various signal integrity (SI) and power integrity (PI) issues can arise. In particular, when the noise couples to vertical interconnects such as through glass vias (TGVs), the SI/PI can be degraded even more at solder joints and micro-bumps [17,18] underneath TGVs due to dimensional mismatches. Various types of noise sources that can cause power/ground noise in the glass interposer PDN are depicted in Figure 2.…”
Section: Figurementioning
confidence: 99%
“…However, due to the non-negligible risks of lead to the human body and environment, lead is required to be removed from electronic products. Currently, many lead-free solders have been studied in various fields as alternatives to Sn-Pb solders, such as Sn-Ag-Cu [ 1 , 2 ], Sn-Bi [ 3 , 4 ], Sn-Zn [ 5 ], Sn-Cu [ 6 ], Sn-In [ 7 ], and so on. Among them, the Sn-Bi series has been extensively studied by researchers for its lower cost and good wettability [ 8 , 9 , 10 ].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, it is a widely-used conductor material for advanced electronic devices owing to its high thermal conductivity, ductility, and strength [3,4]. Electroplating Cu is common in electronic devices for the industrial mass production of conductive traces, wires, and metallizations because of its high deposition rate [5][6][7]. Most electroplating solutions for these devices are based on sulfuric acid and copper sulfate [7][8][9], with organic additives such as chloride ion (Cl − ) as a promoter, polyethylene glycol (PEG) as a suppressor, and bis-(3-sulfopropyl) disulfide (SPS) as an accelerator [10][11][12].…”
Section: Introductionmentioning
confidence: 99%