2014
DOI: 10.3389/fphy.2014.00039
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Grand challenges in low-temperature plasma physics

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Cited by 12 publications
(6 citation statements)
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References 37 publications
(43 reference statements)
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“…Recent advances in low‐temperature plasma science and technology can potentially contribute to the resolution of some of these glass‐industry‐related challenges through novel/optimized/advanced/enabling technologies, for example, high power impulse magnetron sputtering (HiPIMS), gas injection magnetron sputtering (GIMS), plasma‐enhanced atomic layer deposition (PEALD), cryogenic deep reactive‐ion etching (DRIE), laser‐induced plasma‐assisted ablation (LIPAA), plasma‐assisted milling, aerosol‐assisted deposition at atmospheric pressure, plasma printing, plasma‐enhanced chemical vapor deposition (PECVD), atmospheric‐pressure plasma liquid deposition (APPLD), atmospheric‐pressure thermal plasma chemical vapor deposition (TPCVD), plasma‐assisted vapor phase deposition (PAVPD), plasma‐assisted atomic layer deposition (PAALD), and plasma‐assisted pulsed laser/electron deposition (PAPLD/PAPED) …”
Section: The Unique Properties and Importance Of Glass And Opticsmentioning
confidence: 99%
“…Recent advances in low‐temperature plasma science and technology can potentially contribute to the resolution of some of these glass‐industry‐related challenges through novel/optimized/advanced/enabling technologies, for example, high power impulse magnetron sputtering (HiPIMS), gas injection magnetron sputtering (GIMS), plasma‐enhanced atomic layer deposition (PEALD), cryogenic deep reactive‐ion etching (DRIE), laser‐induced plasma‐assisted ablation (LIPAA), plasma‐assisted milling, aerosol‐assisted deposition at atmospheric pressure, plasma printing, plasma‐enhanced chemical vapor deposition (PECVD), atmospheric‐pressure plasma liquid deposition (APPLD), atmospheric‐pressure thermal plasma chemical vapor deposition (TPCVD), plasma‐assisted vapor phase deposition (PAVPD), plasma‐assisted atomic layer deposition (PAALD), and plasma‐assisted pulsed laser/electron deposition (PAPLD/PAPED) …”
Section: The Unique Properties and Importance Of Glass And Opticsmentioning
confidence: 99%
“…Equations (1,2) show that two conditions need to be satisfied to ensure an accurate description of collisions between charged particles and neutrals. First, the differential cross-section assumed in the numerical model must be adequate to ensure a physical determination of post-collision velocities.…”
Section: Motivations For Modeling Neutral Particlesmentioning
confidence: 99%
“…Low-pressure gas discharges and plasma sources are used in a great variety of applications [1,2], such as space propulsion [3,4], neutral beam injection [5] and plasma separation [6][7][8]. To optimize these devices and expand the range of application of low-pressure plasmas, numerical modeling capabilities are highly desirable.…”
Section: Introductionmentioning
confidence: 99%
“…The used power source, the applied gas type, and the gas pressures define the final application and its outcome. Plasma processes are among the key technologies for future innovations in research and development, especially in the field of plasma-assisted deposition, cleaning, and etching [2].…”
Section: Introductionmentioning
confidence: 99%