2:45 Printer Name: Yet to Come 13.2 FABRICATION OF NANOFLUIDIC SYSTEM FOR BIOLOGICAL APPLICATIONS 327 light passes through a mask and lens, which can create nanochannel patterns with the resolution of sub-100 nm [13,14]. Higher resolution of the patterning can be achieved by using extreme UV light [15, 16] to create narrower nanochannels. Also, lithography technologies based on focused beams such as electron-beam lithography (EBL) [7,17] and focused ion beam (FIB) lithography [18,19] are attractive alternatives to create highly precise and reliable nanochannel patterns with features without using the mask. Other maskless patterning methods for nanochannels fabrication include interferometric lithography (IL) (based on the interference of two and more coherent beams) [20], laser patterning [21,22] and surface machining (by etching of the nanometer height sacrificial layer) [23].Here, several exemplary works of applying unconventional patterning methods are listed for nanochannel fabrication. All these unconventional patterning methods can be used to fabricate nanochannels using functional materials other than photoresist with sub-100-nm resolution and the fabrication processes are fast and low cost without extensive use of "clean rooms" and photolithographic equipment [24].
Nanochannel Fabrication by Nanoimprint Lithography (NIL).NIL and NIL-related techniques, such as step-and-flash imprint lithography (S-FIL) can be used as a low cost, high throughput method for the fabrication of nanochannels.Abgrall et al.[25] applied NIL to fabricate planar low aseptic ratio (AR) nanochannels with width in micrometer scale and depth under 100 nm. (Figure Q1 13.1a). First, a silicon mold with the impression of nanochannel was fabricated using standard photolithography and reactive ion etching (RIE). Next, a layer of poly(methylmethacrylate) (PMMA) was hot embossed by this silicon mold to create the nanochannels in PMMA. Subsequently, a second layer of PMMA was bonded to the first sheet by thermal bonding for sealing of the nanochannels. They have successfully fabricated arrays of sealed planar nanochannels in PMMA with a depth of 80 nm and low AR ranging from 0.008 to 0.05. Cao et al. [26] made uniform arrays of nanochannels over large areas of ∼100-mm silicon wafer using NIL (Figure 13.1b). The NIL mold was generated by IL. The nanochannels were further narrowed and sealed by techniques that are based on nonuniform deposition (electron-beam deposition and sputter deposition). The resulting sealed channels had a cross-section as small as 10 nm by 50 nm. The same NIL technique has also been applied to build a sealed 100-nm wide, 200-nm deep nanochannel array on fused silica wafers (Figure 13.1c) [27]. Wang et al. [28] present results on fabrication of high density nanochannels in SU-8 resist, based on nanoimprinting combined with UV curing (S-FIL) (Figure 13.1d). Silicon template with nanopatterns was fabricated by EBL and RIE. A thick layer of SU-8 was spin coated onto a quartz wafer, imprinted by the template, and exposed ...