Gold Nanoparticle Patterning of Silicon Wafers Using Chemical e-Beam Lithography

Abstract

This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.

Patterning of Solution-Processable Materials on Templates Fabricated from Mixed Langmuir-Blodgett Films

“…The numbers following F and H refer to the alkyl chain lengths of the perfluorocarbon and hydrocarbon, respectively, while A indicates the presence of a carboxylic group. Stearic acid H17A was purchased from Fluka, while 12,12,13,13,14,14,15,15,16,16,17,17,18,18,19,19-heptadecafluorononadecanoic acid C 8 F 17 -C 10 H 20 COOH F8H10A was purchased from Wako Pure Chemicals Industries, Ltd. Hexane and tetrahydrofuran THF , which were used as spreading solvents, were of spectroscopic grade and were purchased from Dojindo and Wako Pure Chemical Industries, Ltd., respectively. Hydrogen tetrachloroaurate tetrahydrate, which is a metal precursor, and rhodamine B were purchased from Wako Pure Chemical Industries, Ltd. Methanol was of spectroscopic grade and purchased from Dojindo.…”

Compartmentalized Microhelices Prepared via Electrohydrodynamic Cojetting

“…In addition, helical morphologies are of fundamental scientific interest because a better understanding of physical and chemical behaviors of helical structures can provide crucial clues to understanding biological systems. Nevertheless, the realization of helically patterned, synthetic multicompartmental microbuilding blocks have been limited to a small number of techniques, such as E‐beam lithography15 or block copolymer self‐assembly methods 16…”

Dopant Driven Electron Beam Lithography

“…Electron beam lithography is a multi-step process in which a sacrificial polymer layer is first deposited onto the sample that can achieve feature sizes down to ten nanometer length scales (Broers et al 1996;Liu et al 2002). The electron beam can also be used to locally induce or break bonds to pattern nanostructures (Mendes et al 2004) or simply burn material away from selected areas of the sample (Egerton et al 2004). In essentially every case, the electron beam interacts with the surface to locally alter or break chemical bonds to form patterned surface structures with very high precision.…”