Gold nanoparticle arrays organized in mixed patterns through directed self-assembly of ultrathin block copolymer films on topographic substrates

Eren, Noga; Burg, Ofer; Michman, Elisheva; Popov, Inna; Shenhar, Roy

doi:10.1016/j.polymer.2022.124727

Cited by 6 publications

(7 citation statements)

References 63 publications

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“…This dewetting behavior is common to all the patterned areas studied in this work. Previous research using polystyrene- block -poly(2-vinyl pyridine) (PS- b -P2VP) showed the formation of islands and holes, which were structured similarly to the dewet domains in this study (i.e., islands developed almost exclusively over the topographically patterned region of the substrate and were elongated perpendicular to the direction of the topographic features) [ 82 ]. It was concluded that the local thickness incommensurability that is inherently induced by the topographic pattern led to the formation of islands and holes.…”

Section: Resultssupporting

confidence: 54%

“…Although the film formed dewet domains and regions with exposed plateau surfaces, the film did not dewet in the trenches but rather coarsened during the annealing process, forming islands and holes along the trench direction. Analogously to the correlated coarsening of PS- b -P2VP films [ 82 ], a spatial correlation is observed between the terracing patterns in the trenches and the dewetting patterns on the plateaus. Figure 7 b,c, which show high-magnification SEM images of dewet films cast over different patterns, reveal that trench regions that are flanked by exposed plateau regions on both sides exhibit a dot morphology, which is consistent with the lower film thickness observed in these regions ( Figure 7 d).…”

Section: Resultsmentioning

confidence: 76%

“…It was concluded that the local thickness incommensurability that is inherently induced by the topographic pattern led to the formation of islands and holes. Additionally, consideration of the forces acting on the polymer film while it coarsens during annealing led to the conclusion that the flow of material occurs mostly along the trenches and plateaus in a correlated motion, and thus the islands that form appear elongated perpendicular to the direction of the topographic features and continue smoothly across the plateau edge [ 82 ]. It seems reasonable to assume that the dewetting of ultrathin PS- b -PMMA films on deep topographic patterns, which is analogous to the formation of islands and holes, occurs in a similar fashion.…”

Section: Resultsmentioning

confidence: 99%

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Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

2023

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Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.

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Section: Resultssupporting

confidence: 54%

Section: Resultsmentioning

confidence: 76%

Section: Resultsmentioning

confidence: 99%

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Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

2023

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“…This work highlights the crucial role that the curvature of the film at the plateau edges plays in the development of local morphologies on the plateaus and in the trenches. This insight adds to the known dependence of the local morphology on slight variations in film thickness, which are afforded by the topographic features, and that may lead to the controlled creation of dual patterns [36,37]. We suggest that the gradual variation in film thickness at the plateau edges leads to the formation of perpendicularly oriented domains along the edges, which further template the formation of additional domains that may cover the entire plateau.…”

Section: Discussionmentioning

confidence: 64%

“…with the extreme sensitivity of the morphology of ultraconfined films to film thickness and substrate selectivity, this mechanism leads to the formation of different patterns on the plateaus and in the trenches. A follow-up study has substantiated this effect on a different type of block copolymer (polystyrene-block-poly(2-vinyl pyridine) with a cylindrical composition) [37].…”

Section: Introductionmentioning

confidence: 87%

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

2022

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The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.

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Nanoparticle Assembly: From Self‐Organization to Controlled Micropatterning for Enhanced Functionalities

Jambhulkar,

Ravichandran,

Zhu

et al. 2023

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Nanoparticles form long‐range micropatterns via self‐assembly or directed self‐assembly with superior mechanical, electrical, optical, magnetic, chemical, and other functional properties for broad applications, such as structural supports, thermal exchangers, optoelectronics, microelectronics, and robotics. The precisely defined particle assembly at the nanoscale with simultaneously scalable patterning at the microscale is indispensable for enabling functionality and improving the performance of devices. This article provides a comprehensive review of nanoparticle assembly formed primarily via the balance of forces at the nanoscale (e.g., van der Waals, colloidal, capillary, convection, and chemical forces) and nanoparticle‐template interactions (e.g., physical confinement, chemical functionalization, additive layer‐upon‐layer). The review commences with a general overview of nanoparticle self‐assembly, with the state‐of‐the‐art literature review and motivation. It subsequently reviews the recent progress in nanoparticle assembly without the presence of surface templates. Manufacturing techniques for surface template fabrication and their influence on nanoparticle assembly efficiency and effectiveness are then explored. The primary focus is the spatial organization and orientational preference of nanoparticles on non‐templated and pre‐templated surfaces in a controlled manner. Moreover, the article discusses broad applications of micropatterned surfaces, encompassing various fields. Finally, the review concludes with a summary of manufacturing methods, their limitations, and future trends in nanoparticle assembly.

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Gold nanoparticle arrays organized in mixed patterns through directed self-assembly of ultrathin block copolymer films on topographic substrates

Cited by 6 publications

References 63 publications

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

Nanoparticle Assembly: From Self‐Organization to Controlled Micropatterning for Enhanced Functionalities

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