Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination

Zhao, Zeyu; Luo, Yanhong; Zhang, Wei; Wang, Changtao; Gao, Ping; Wang, Yanqin; Pu, Mingbo; Yao, Na; Zhao, Chengwei; Luo, Xiangang

doi:10.1038/srep15320

Cited by 38 publications

(26 citation statements)

References 38 publications

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“…In the high-k limit, the phase difference between the |E x | and |E z | components is about π/2, which will cause a half-pitch shift in the distribution of [41,42]. Additionally, the ratio between the electric field components |E x | and |E z | plays a crucial role in obtaining an image with high fidelity.…”

Section: Effect Of Rough Films In Photolithographymentioning

confidence: 99%

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

et al. 2017

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Abstract:The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evanescent wave passband, which also makes it inherently vulnerable to the roughness of the thin film and imperfections of the mask. On the other hand, the HMM system has spatial frequency filtering characteristics and its pattern formation is based on interference, producing uniform and stable periodic patterns. In this work, we show that the HMM system is more immune to such imperfections due to its function of spatial frequency selection. The analyses are further verified by an interference lithography system incorporating the photoresist layer as an optical waveguide to improve the aspect ratio of the pattern. It is concluded that a system capable of spatial frequency selection is a powerful method to produce deep-subwavelength periodic patterns with high degree of uniformity and fidelity.

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Section: Effect Of Rough Films In Photolithographymentioning

confidence: 99%

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

et al. 2017

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“…Early results presented by Gao et al showed an improvement of the low aspect ratio from smaller than 1:4 height:half‐pitch to about 1:1.4 . Zhao et al extended the tolerance of cavity lens lithography against object‐image distance to 120 nm by off‐axis illumination . Liu et al applied the cavity lens lithography on a similar system as the one mentioned above for fabricating metasurfaces as shown in Figure .…”

Section: Enhancement Of Image Fidelity and Aspect Ratios In Evanescenmentioning

confidence: 99%

Plasmonic Lithography: Recent Progress

Hong

Blaikie

2019

Advanced Optical Materials

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Plasmonic lithography has received extensive attention as both a potential candidate for next generation lithography and as an interesting testbed to test the fundamental resolution limits of optical imaging and patterning. Owing to the utilization of the otherwise lost evanescent near fields containing high frequency information, surface plasmon-based lithographic techniques can break the diffraction limit in conventional photolithography; resolution down to approximately 20 nm using visible light has been experimentally demonstrated, and theoretical studies have analyzed methods that have the potential for creating nanopatterns with sub-10 nm resolution. This paper reviews the research progress and various modalities of plasmonic lithography, addresses current obstacles and problems, and provides an outlook for practical application.

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“…In 2004, it was predicted that by reducing the thickness of metallic thin film, the effective wavelength could be reduced by an order of magnitude, which was finally realized using a cavity lens after 10 years' development . Meanwhile, the gap plasmon modes in MIM structures have also been intensively investigated to realize higher imaging quality, flat plasmonic lenses, and structural color . As illustrated in Figure e, the MIM cavity lens can be seen as a combination of a superlens and reflective mirror.…”

Section: Applicationsmentioning

confidence: 99%

Methodologies for On‐Demand Dispersion Engineering of Waves in Metasurfaces

Guo

et al. 2019

Advanced Optical Materials

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IntroductionMetasurfaces and surface waves are two booming research branches in modern optics and wave physics. As 2D counterparts of 3D metamaterials, metasurfaces have inherited many unusual properties of artificially structured metamaterials, e.g., negative refraction, super-resolution imaging, and invisibility. [1][2][3][4][5][6] Nevertheless, owing to the reduced dimension, metasurfaces are much easier to fabricate, thus providing possibilities to transform theoretical innovations to practical applications. [7,8] In principle, the mechanisms of light-matter interaction in metasurfaces are related to the exotic physical properties of surface waves on metasurfaces. There are many kinds of surface waves propagating along interfaces of two kinds of media, such as surface plasmons, Dyakonov, Bloch, and Tamm surface waves. [9,10] Surface plasmons require that one of the media has negative permittivity; Dyakonov surface waves require linear anisotropy of at least one of the media. Bloch and Tamm surface waves require periodic permittivity of one of the media truncated by the interface or along the interface. In this paper, we would like to highlight the Dispersion is one common yet critical property of all kinds of waves. It is related to the spatial and spectral evolution of waves in structured materials. This review gives a summary of the methodologies used for the on-demand dispersion engineering of waves in metasurfaces, which possess many unusual properties such as extremely short wavelength, diffraction-less directional propagation, and tunable phase shift, resulting in many exciting applications with performances beyond the limitations set by traditional geometric and physical optics. Since most metasurfaces could be continuously transformed from simple thin films, the methodologies proposed here are universal and may be applied to analyze and design various functional metasurfaces. Dispersion EngineeringWithout loss of generality, the geometry of almost all metasurfaces could be continuously transformed from simple thin films. The transformation process is illustrated in Figure 1. First, by stacking and bending multilayers, one obtain the superlens, planar hyperlens, and curved hyperlenses. [26][27][28] The hyperbolic dispersion in anisotropic metal-dielectric structures may lead to the formation of Dyakonov plasmons, which are similar to Dyakonov waves on anisotropic dielectric materials. [29][30][31][32][33][34] Second, a 90° rotation of the multilayer would result a 1D grating, which can be either periodic or gradient. Third,

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Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination

Cited by 38 publications

References 38 publications

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Plasmonic Lithography: Recent Progress

Methodologies for On‐Demand Dispersion Engineering of Waves in Metasurfaces

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