Atomic structure of amorphous silicon consistent with several reported experimental measurements has been obtained from annealing simulations using electron density functional theory calculations and a systematic removal of weakly bound atoms. The excess energy and density with respect to the crystal are well reproduced in addition to radial distribution function, angular distribution functions, and vibrational density of states. No atom in the optimal configuration is locally in a crystalline environment as deduced by ring analysis and common neighbor analysis, but coordination defects are present at a level of 1%-2%. The simulated samples provide structural models of this archetypal disordered covalent material without preconceived notion of the atomic ordering or fitting to experimental data.Amorphous silicon (a-Si) is the archetypal disordered covalently bonded material. It is also widely used for industrial purposes, with numerous applications in electronics and photovoltaics. Both aspects have triggered an intense research activity during the last few decades. a-Si can be obtained using several preparation techniques, including ion implantation, laser melting followed by fast quenching, various growth methods, and indentation [1][2][3][4][5][6]. The characteristics of the a-Si samples depend on the preparation method [7]. For example, vapor deposition often gives samples that include voids. Also, a-Si obtained by ion implantation tends to include a significant amount of coordination defects. But, annealing of the various types of samples seems to bring them closer to some common, ideal a-Si structure. The nature of this state is, however, a matter of long standing controversy. In addition to gaining an understanding of the basic characteristics of covalently bonded disordered networks, good structural models are an important prerequisite for theoretical investigations of the electronic and mechanical properties of such materials [8].Several different procedures have been proposed to generate realistic atomic scale models of a-Si. One approach is to generate a continuous random network (CRN) which can be built using various algorithms to give a structure with only 4-fold coordinated atoms, i.e. containing no coordination defects [9][10][11]. Another structural model involves nanoscopic crystal grains embedded in a disordered matrix. Arguments in favor of the latter have recently been presented in connection with an analysis of ion implantation samples [5,12]. Finally, constraints derived from experimental data have been used to guide the construction of a-Si models [13][14][15].Most of the proposed models have been able to reproduce well some of the measured structural features such as the radial distribution function (RDF) and bond angle distributions. The RDF, however, cannot discriminate between the various topological networks [12], and detailed information about the angular distributions is hard to obtain from experiments. To progress further in the search for an optimal a-Si model, Drabold recently pro...