Glasses for microsystems technology

Hülsenberg, Dagmar

doi:10.1016/s0026-2692(96)00071-7

Cited by 15 publications

(5 citation statements)

References 1 publication

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“…From the SEM/EDS analysis glass is also observed on titanium surface, this indicates interface failure of titanium/glass. Besides, the polyimide surface is showing crazes, consisting of numerous thin of stretched molecular chains which are drawn from the polymer (Ref [25][26][27][28]. So, failure took place on the glass, on the Ti/glass interface and also cohesive failure on polymer; the failure pattern was mix mode.…”

Section: Resultsmentioning

confidence: 99%

Analysis of Titanium-Coated Glass and Imidex (PI) Laser Bonded Samples

Lubna

Newaz

2011

J. of Materi Eng and Perform

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Based on previous results of bond strength, scanning electron microscopy(SEM)/energy dispersive spectroscopy (EDS) and x-ray photoelectron spectroscopy (for thin film thickness in the range of 50 to 200 nm range), it is expected for a moderate film thickness of titanium (over 50 nm) for the system of sputtered Ti-coated glass/polymer two factors play important roles in getting strong bond between Ti/Polyimide interface: (i) mechanical interlocking property and (ii) chemical bond formation such as Ti-C, Ti-O between Ti and imidex (PI) film. In this study, a systematic investigation has been conducted to understand the effects of thin films on bond quality and on failure mechanism of the interface between 400 nm sputtered Ti-coated glass/imidex (PI) system. This article basically studies if for this higher film thickness the failure pattern and bond strength are consistent with the previous data. From previous studies (for thin film thickness of 50 to 200 nm) the conclusion extracted is thin film with thickness of less than 50 nm exhibited low bond strength when compared to film thickness over 50 nm and from the results obtained in this study it is concluded that the bond reliability and failure modes of sputtered Ti film on glass are consistent even for a film thickness as high as 400 nm and three types of failure modes are found : (i) cohesive failure mode, (ii) Ti/glass interface failure mode, and (iii) glass failure mode. The roughness value for this coating thickness is 17 nm.

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Section: Resultsmentioning

confidence: 99%

Analysis of Titanium-Coated Glass and Imidex (PI) Laser Bonded Samples

Lubna

Newaz

2011

J. of Materi Eng and Perform

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“…Therefore, no additional SiO 2 or Si 3 N 4 insulating coatings are needed in contrast to Si-wafer-based -SOFCs [7][8][9]. Thermal expansion coefficients close to the ceramic -SOFC thin film layers [10] and the possibility to structure via selective UVexposure through shadow masks without the use of conventional photoresists [7] are attractive.…”

Section: Microfabrication Of Micro-solid Oxide Fuel Cells Devicesmentioning

confidence: 99%

“…Even though the difference in etch-rates between the -SOFC electrolyte thin film and the Foturan ® wafer substrate is large this does not signify the thin film as a good etch stop. According to literature, Foturan ® etching proceeds over the grain boundaries whereby its grains disconnect and fall out [8][9][10]. Since its grains are in tenths of microns in size within 1 min already one grain layer is etched according to its etch-rate.…”

Section: Guidance For the Foturan ® -Based -Sofc Processing With Precmentioning

confidence: 99%

Wet-etching of precipitation-based thin film microstructures for micro-solid oxide fuel cells

Rupp

Muecke

Nalam

et al. 2010

Journal of Power Sources

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“…Das Spektrum der Anwendungen erstreckt sich von mechanischen Funktionselementen wie z. B. mikromechanische Greifer und Federn, Komponenten für die Mikrofluidik und Mikroreaktionstechnik, mikrooptische Bauteile bis hin zu aktiven Materialien für die Mikrosensorik [1][2][3]. Die Strukturierungstechnologien sind vielfältig (mechanisch, optisch, chemisch/physikalisch) und ihr Einsatz abhängig vom verwendeten Glaswerkstoff und den konkreten Anforderungen an die herzustellenden Mikrobauteile.…”

Section: Einfü Hrungunclassified

“…Die Entwicklung derartiger Gläser mit variablen Eigenschaftsprofilen ist am Fachgebiet Glasund Keramiktechnologie der TU Ilmenau seit mehr als 10 Jahren Forschungsgegenstand [2]. Eine Zusammenfassung der wesentlichen Eigenschaften des für die Versuche verwendeten fotostrukturierbaren Glases FS21 gibt [3].…”

Section: Wechselwirkungsprozesse Zwischen Fotosensiblem Glas Und Uv-lunclassified

Einfluss von UV‐Laserparametern auf die geometrische Strukturierung von fotosensitivem Glas

Brokmann

Harnisch

Hülsenberg

2003

Materialwissenschaft Werkst

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Der Werkstoff Glas ist zunehmend ein interessanter Konstruktionswerkstoff für die Mikrotechnik. Zur Mikrobearbeitung von fotostrukturierbaren Gläsern wird die Eigenschaft Fotosensibilität im UV‐Bereich ausgenutzt. Als „fotosensibel”︁ gilt ein Glas u. a. dann, wenn es unter Einfluss räumlich begrenzter energiereicher UV‐Strahlung und anschließender thermischer Behandlung nur in den belichteten Bereichen kristallisiert. Die Mikrostrukturierung erfolgt durch anschließendes nasschemisches Ätzen der kristallisierten Bereiche. Die Belichtung fotosensitiver Gläser mittels konventioneller Maskaligner ist gegenwärtig Stand der Technik. Ein alternatives Verfahren dazu stellt die Belichtung mittels UV‐Laserstrahlung dar. Es werden Zusammenhänge zwischen Laserparametern und erzeugten Strukturgeometrien diskutiert.

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Glasses for microsystems technology

Cited by 15 publications

References 1 publication

Analysis of Titanium-Coated Glass and Imidex (PI) Laser Bonded Samples

Analysis of Titanium-Coated Glass and Imidex (PI) Laser Bonded Samples

Wet-etching of precipitation-based thin film microstructures for micro-solid oxide fuel cells

Einfluss von UV‐Laserparametern auf die geometrische Strukturierung von fotosensitivem Glas

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