2016
DOI: 10.1088/0960-1317/26/3/035018
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Glass frit bonding with controlled width and height using a two-step wet silicon etching procedure

Abstract: A simple and versatile two-step silicon wet etching technique for the control of the width and height of the glass frit bonding layer has been developed to improve bonding strength and reliability in wafer-level microelectromechanical systems (MEMS) packaging processes. The height of the glass frit bonding layer is set by the design of a vertical reference wall which regulates the distance between the silicon wafer and the encapsulation capping substrate. On the other hand, the width of the bonding layer is co… Show more

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Cited by 6 publications
(1 citation statement)
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References 12 publications
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“…There are techniques to restrict the print area of glass frit by raising the seal ring, or to prevent the molten glass frit from expanding inside a device through providing grooves on the internal side of the seal ring. 18 However, these techniques not only require additional cost, but also make it difficult for feedthrough wiring to traverse the seal ring.…”
mentioning
confidence: 99%
“…There are techniques to restrict the print area of glass frit by raising the seal ring, or to prevent the molten glass frit from expanding inside a device through providing grooves on the internal side of the seal ring. 18 However, these techniques not only require additional cost, but also make it difficult for feedthrough wiring to traverse the seal ring.…”
mentioning
confidence: 99%