2007
DOI: 10.1002/pssa.200723201
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GISAXS study of the alignment of oriented carbon nanotubes grown on plain SiO2/Si(100) substrates by a catalytically enhanced CVD process

Abstract: We report a quantitative Grazing Incidence Small Angle X-Ray Scattering (GISAXS) study of the alignment of mutually oriented carbon nanotubes (CNTs) grown by a catalytically-activated, a plasma direct current and hot filaments-assisted (DC HF CCVD) process. Metallic catalytic (Co) islands were dispersed on plain SiO 2 (5 nm thickness)/Si(100) substrates prior the growth of CNTs which can be considered as highly anisotropic 1D nanostructures. The GISAXS pattern analysis in the framework of the DistortedWave Bor… Show more

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Cited by 8 publications
(11 citation statements)
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“…The third part of table 1 summarizes the comparative analysis regarding the characteristics of MWNTs grown on micronsized dots as a function of the catalytic metal and the ammonia concentration during the CVD process, the other experimental conditions remaining unchanged. As we have seen for sample D, the addition of NH 3 in the gaseous mixture strongly increases the MWNT growth rate [28], but also modifies the micron-sized dot shape (at high NH 3 content), the density but also the quality of the nanotubes. Thus, accounting for all these parameters a good compromise would be to use 0.5% NH 3 [29].…”
Section: Choice Of Experimental Conditions and Dot Size Rangesupporting
confidence: 59%
“…The third part of table 1 summarizes the comparative analysis regarding the characteristics of MWNTs grown on micronsized dots as a function of the catalytic metal and the ammonia concentration during the CVD process, the other experimental conditions remaining unchanged. As we have seen for sample D, the addition of NH 3 in the gaseous mixture strongly increases the MWNT growth rate [28], but also modifies the micron-sized dot shape (at high NH 3 content), the density but also the quality of the nanotubes. Thus, accounting for all these parameters a good compromise would be to use 0.5% NH 3 [29].…”
Section: Choice Of Experimental Conditions and Dot Size Rangesupporting
confidence: 59%
“…The flux rate at 973 K is estimated to 0.025 nm of equivalent layer per minute from an in situ XPS analysis of the Co2p/Si2p signal. In other cases the transition metal is deposited by sputtering within conditions that have been elsewhere described [39].…”
Section: Substrate Sample Preparation Tm/sio2/si(100)mentioning
confidence: 99%
“…The nature of the carbon deposit was probed by Raman spectroscopy on a Renishaw apparatus with a He-Ne light source. More structural and spectroscopic data are reported in [39].…”
Section: Surface Analyses Morphological and Structural Characterizatmentioning
confidence: 99%
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“…This process requires the presence of transition metal particles (Co, Fe, Ni) as a catalyst spread onto the surface. It has been shown in previous studies that the size and density of these metallic particles govern the size and distribution of the grown CNTs [5][6][7][8]. So, an in situ process by Ultra High Vacuum (UHV) metal evaporation at high temperature on an SiO 2 /Si(100) substrate has been used to get monodisperse and uniform spatial distributions of these particles [6,7].…”
Section: Introductionmentioning
confidence: 99%