Graphene supported on a transition metal dichalcogenide substrate offers a novel platform to study the spin transport in graphene in presence of a substrate induced spin-orbit coupling, while preserving its intrinsic charge transport properties. We report the first non-local spin transport measurements in graphene completely supported on a 3.5 nm thick tungsten disulfide (WS 2 ) substrate, and encapsulated from the top with a 8 nm thick hexagonal boron nitride layer. For graphene, having mobility up to 16,000 cm 2 V −1 s −1 , we measure almost constant spin-signals both in electron and hole-doped regimes, independent of the conducting state of the underlying WS 2 substrate, which rules out the role of spin-absorption by WS 2 . The spin-relaxation time τ s for the electrons in graphene-on-WS 2 is drastically reduced down to ∼ 10 ps than τ s ∼ 800 ps in graphene-on-SiO 2 on the same chip. The strong suppression of τ s along with a detectable weak anti-localization signature in the quantum magneto-resistance measurements is a clear effect of the WS 2 induced spin-orbit coupling (SOC) in graphene. Via the top-gate voltage application in the encapsulated region, we modulate the electric field by 1 V/nm, changing τ s almost by a factor of four which suggests the electric-field control of the in-plane Rashba SOC. Further, via carrierdensity dependence of τ s we also identify the fingerprints of the D'yakonov-Perel' type mechanism in the hole-doped regime at the graphene-WS 2 interface.