Giant magnetoresistive coatings using thermionic vacuum arc technology

Anghel, A.; Lungu, C.P.; Mustaţǎ, I.; Zaroschi, V.; Lungu, A. M.; Barbu, Ion; Bădulescu, Marius; Pompilian, O. G.; Schinteie, G.; Predoi, Daniela; Kunkser, V.; Filoti, G.; Apetroaei, N.

doi:10.1007/s10582-006-0173-8

Cited by 4 publications

(2 citation statements)

References 8 publications

(5 reference statements)

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“…Granular, GMR structures where the magnetic metal is uniformly distributed throughout the non-magnetic metal crystal net [44,45]; d. Granular, TMR structures where the nonmagnetic crystal net of the previous structure is replaced by an insulator [46,47]; e.…”

Section: Cmentioning

confidence: 99%

Thermionic Vacuum Discharges for Thin Film Depositions

Mustata,

Lungu,

Jepu

et al. 2023

Coatings

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The thermionic vacuum discharge method is very effective in that the films obtained using this technology are characterised by a very high degree of adhesion, density and purity because the deposition technique is carried out in high, very high or, if possible, in ultra-very high vacuum conditions with no gas present. When the substrate is placed in vacuum, no heat transfer particles are present, the substrate being heated only by the ion incident on the surface. This advantage recommends the TVD method for deposits on plastics or other thermally sensitive materials. Additionally, this slow heat transfer reduces energy loss, making the deposition method industrially competitive. The paper aims to present theoretical aspects of this type of discharge, compared to typical or more popular plasmas but also to present the achievements of this method and its utility in the thin films production, layers that have specific imposed properties. The practical depositions and applications presented are in the nuclear fusion-related material science and also for obtaining materials for granular structures, used as magneto-resistive coatings.

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Section: Cmentioning

confidence: 99%

Thermionic Vacuum Discharges for Thin Film Depositions

Mustata,

Lungu,

Jepu

et al. 2023

Coatings

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“…∆R/R around 38% was obtained in this work for certain samples, however, questions remained about the actual mechanism of the effect with respect to the film properties. The importance of specific deposition conditions and film parameters on the magnetoresistance behavior attempts to explain the work [219]. In this paper, the Fe-Cu and Fe-Co MR systems were prepared by a dual TVA on the Kapton and Si substrates.…”

Section: Materials Having Gmr/tmr Propertiesmentioning

confidence: 99%

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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