The influence of deposition conditions on the structure, magnetic properties, and electrical resistivity of Fe-Hf-O films, prepared by the supersonic plasma jet deposition technique, was investigated. Composition of the films was controlled by the nozzle composition and the working gas. It varied in the limits: 15-68 at.% of Fe, 0.5-8 at.% of Hf and 29-80 at.% of O. The films were mainly X-ray amorphous. Some of them showed a weak and broad peak near the [110] reflection of α-Fe indicating the presence of Fe-rich clusters in an amorphous matrix. Depending on the deposition parameters the magnetic properties vary from paramagnetic to ferromagnetic ones. The electrical resistivity changes from the metallic to the hopping type. 1n some samples a large negative magnetoresistance is observed.PACS numbers: 75.50.Kj, 75.70.Ρa Nanogranular composites, consisting of ferromagnetic metal grains in an insulating matrix, are under the growing interest due to their prominent magnetic and magnetoresistant properties. The nanogranular Fe-Hf-O films, prepared by the reactive magnetron sputtering, exhibit good soft magnetic properties together with high resistivity in the Fe-rich region [1] and the giant magnetoresistance behavior in the Fe-poor region [2].In this work the Fe-Hf-O films, prepared by the supersonic plasma jet method, were investigated. This method provides some advantages in comparison with the conventional reactive magnetron sputtering [3]. A simple scheme of the reactive plasma jet reactor is shown in Fig. 1. The material of the source is sputtered by the ions produced in the RF hollow cathode discharge. One RF electrode is formed by the nozzle connected to RF generator (27.12 MHz, 500 W). The hollow cathode discharge takes place at the nozzle mouth in the working gas (the mixture of Ar and H2) coming through the nozzle into the reactor chamber. The grounded wall of the chamber and the substrate holder are the second electrode. The atoms and ions sputtered from the inner wall of the nozzle are drifted towards the substrate by the working gas leaving the nozzle with supersonic velocity. The supersonic plasma forms a well defined channel with high chemical reactivity. The (515)