Getting the most out of your cerium oxide glass polishing slurry: reducing risk and improving performance with plasma produced particles

Murray, Patrick G.; Hooper, Abigail R.; Keleher, Jason J.; Kaiser, Jordan; Nichol, Meghan

doi:10.1117/12.2028868

SPIE Proceedings

2013

DOI: 10.1117/12.2028868

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Getting the most out of your cerium oxide glass polishing slurry: reducing risk and improving performance with plasma produced particles

Patrick G. Murray

Abigail R. Hooper

Jason J. Keleher

et al.

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Getting the most out of your cerium oxide glass polishing slurry: reducing risk and improving performance with plasma produced particles

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