2016
DOI: 10.1364/oe.24.011987
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Germanium-on-SOI waveguides for mid-infrared wavelengths

Abstract: We report on the development of Germanium-on-SOI waveguides for mid-infrared wavelengths. The strip waveguides have been formed in 0.85 and 2 μm thick Ge grown on SOI substrate with 220 nm thick Si overlayer. The propagation loss for various waveguide widths has been measured using the Fabry-Perot method with temperature tuning. The minimum loss of ~8 dB/cm has been achieved for 0.85 μm thick Ge core using 3.682 μm laser excitation. The transparency of these waveguides has been measured up to at least 3.82 μm.

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Cited by 39 publications
(18 citation statements)
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“…Therefore, GOI is adopted as the platform to fabricate the MIR waveguides because the BOX in the SOI substrate can relieve this problem as an isolation layer. Younis et al recently reported the GOI waveguides at 3.682 μm, with a loss of ∼8 dB∕cm [34]. In their following work, the rapid thermal annealing process was used to reduce the loss [35].…”
Section: Review Of Research For Mir Photonics a Platform And Mir Wavmentioning
confidence: 99%
See 1 more Smart Citation
“…Therefore, GOI is adopted as the platform to fabricate the MIR waveguides because the BOX in the SOI substrate can relieve this problem as an isolation layer. Younis et al recently reported the GOI waveguides at 3.682 μm, with a loss of ∼8 dB∕cm [34]. In their following work, the rapid thermal annealing process was used to reduce the loss [35].…”
Section: Review Of Research For Mir Photonics a Platform And Mir Wavmentioning
confidence: 99%
“…Given the large transparency window of 2-14 μm, germanium is a suitable material for the MIR wavelength beyond 8 μm. The MIR waveguides are demonstrated in various germanium-based platforms, such as germanium-on-silicon (GOS) [32,33], germanium-on-SOI (GOI) [34][35][36], and germanium-on-silicon nitride (GOSN) [37]. Other platforms including silicon-on-silicon nitride (SOSN) [38], sapphire-onsilicon (SOS) [39,40], SiGe alloy-on-silicon (SGOS) [41], and aluminum nitride-on-insulator (ANOI) [42] are also explored to demonstrate the MIR photonics devices.…”
Section: Introductionmentioning
confidence: 99%
“…The measurements show a decreasing trend in the propagation loss with an increase in waveguide width. This can be explained due to the reduction in mode overlap with waveguide sidewalls [32]. However, an abrupt increase in the propagation loss in wider waveguides, i.e., width beyond 7 μm in 0.85 μm thick Ge core and width beyond 3.5 μm in 2 μm thick Ge core, is attributed to the multi-mode excitation.…”
Section: Ge-on-soi Mid-ir Waveguidesmentioning
confidence: 99%
“…Strip waveguides have been developed in Ge-on-SOI, for which the starting SOI substrate has an overlaying Si layer of thickness 220 nm and a buried oxide of thickness 2 μm. The Ge growth process has been reported in [32]. We have prepared two samples of Ge core with thicknesses 0.85 μm and 2 μm in order to assess the loss variation.…”
Section: Ge-on-soi Mid-ir Waveguidesmentioning
confidence: 99%
“…This makes it a suitable silicon photonics material systems for on-chip spectroscopic systems for gas and liquid sensing, monitoring of air or oil quality, control of engine emissions, free-space communication and light detection and ranging (LiDAR) systems [117], [122], [126]. Apart from GOS, there has been a variety of other Germanium-based mid-infrared technology platforms such as Germanium-on-SOI [127]- [129], Germanium-on-Silicon Nitride [130], Si (1−x) Ge x -on-Silicon [131] and suspended Germanium [132], [133]. Figure 4 gives an overview of the various single-mode waveguide cross-sections possible with the different flavours of silicon photonics platforms discussed above.…”
Section: Germanium Based Silicon Photonicsmentioning
confidence: 99%