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2021
DOI: 10.1016/j.mtcomm.2020.101718
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Germanene/2D-SiC van der Waals heterobilayer: Structural features and tunable electronic properties

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Cited by 23 publications
(17 citation statements)
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“…We obtained 1.847 Å for the bond length and 3.138 Å for the lattice constant for the SiC monolayer. These findings match closely with the previous results 21 , 57 , 58 . We considered three different stacking patterns by placing a 2 × 2 2D-GeC ( = = 6.276 Å) layer above a 2 × 2 2D-SiC ( = = 6.492 Å) monolayer with different configurations.…”
Section: Resultssupporting
confidence: 94%
“…We obtained 1.847 Å for the bond length and 3.138 Å for the lattice constant for the SiC monolayer. These findings match closely with the previous results 21 , 57 , 58 . We considered three different stacking patterns by placing a 2 × 2 2D-GeC ( = = 6.276 Å) layer above a 2 × 2 2D-SiC ( = = 6.492 Å) monolayer with different configurations.…”
Section: Resultssupporting
confidence: 94%
“…The SiC/AlN van der Waals bilayer heterostructure (vdWBH) is achieved through staking the primitive cell of the monolayer AlN above the primitive cell of 2D-SiC. Our calculation yielded the lattice constants of 3.094 Å and 3.126 Å for SiC and AlN, respectively, which are in excellent agreement with the previous theoretical and experimental results 46,47,50,[64][65][66][67][68][69][70][71] . Accordingly, a small lattice mismatch (LMM) of ~ 1.02% is present between the SiC and AlN monolayers, as obtained using the formula LMM = a SiC −a AlN 0.5×(a SiC + a AlN ) × 100% , where a SiC and a AlN are the optimized lattice constants of the 2D-SiC and 2D-AlN, respectively.…”
Section: Resultssupporting
confidence: 86%
“…[37][38][39] Further, calculation studies have shown the benefits of combining germanene and SiC layers to tune the electronic properties of Ge-based derivatives. [40] Consequently, engineering robust organic-inorganic 2D-Ge heterostructures employing covalent chemistry would be a fruitful path toward devising advanced 2D-Ge materials/ devices for task-specific applications.…”
Section: Introductionmentioning
confidence: 99%