Simulation of Semiconductor Processes and Devices 2004 2004
DOI: 10.1007/978-3-7091-0624-2_82
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Genetic Algorithm for Optimization and Calibration in Process Simulation

Abstract: This paper proposes the use of genetic algorithms for process optimization and calibration of model parameters. The main principles of these evolution inspired optimizers are briefly explained. Afterwards, their application to two process simulation tasks is presented: (1) a layout problem in lithography processes and (2) the extraction of physical parameters of a diffusion model. The obtained results are shortly discussed.

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