2016
DOI: 10.1063/1.4954080
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Generic technique to grow III-V semiconductor nanowires in a closed glass vessel

Abstract: Crystalline III-V semiconductor nanowires have great potential in fabrication of nanodevices for applications in nanoelectronics and optoelectronics, and for studies of novel physical phenomena. Sophisticated epitaxy techniques with precisely controlled growth conditions are often used to prepare high quality III-V nanowires. The growth process and cost of these experiments are therefore dedicated and very high. Here, we report a simple but generic method to synthesize III-V nanowires with high crystal quality… Show more

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“…In actual computation, the above eigenvalue equation [Eq. (29)] is expressed, by assembling the submatrices in all elements into a larger FEM matrix, as…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…In actual computation, the above eigenvalue equation [Eq. (29)] is expressed, by assembling the submatrices in all elements into a larger FEM matrix, as…”
Section: Discussionmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] With advances in the materials technology, highquality semiconductor nanowire have been obtained through, for instance, molecular-beam epitaxy, [18][19][20] metal-organic vapor phase epitaxy, [21][22][23] and chemical vapor deposition. [24][25][26][27][28][29] Due to their well organized crystal structures, relatively high carrier mobilities, small cross sections, and strong quantum confinement effects, III-V semiconductor nanowires have been employed to construct field-effect transistors, [30][31][32][33] infrared photodetectors, 34,35 light emission diodes, 36,37 thermal electrical devices, 38,39 laser devices, 40,41 solar cells, [42][43][44][45] and quantum devices. [11]…”
Section: Introductionmentioning
confidence: 99%