2011
DOI: 10.1109/tns.2011.2171502
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Generic Radiation Hardened Photodiode Layouts for Deep Submicron CMOS Image Sensor Processes

Abstract: Selected radiation hardened photodiode layouts, manufactured in a deep submicron CMOS Image Sensor technology, are irradiated by 60 Co γ-rays up to 2.2 Mrad(SiO2) and studied in order to identify the most efficient structures and the guidelines (recess distance, bias voltage) to follow to make them work efficiently in such technology. To do so, both photodiode arrays and active pixel sensors are used. After 2.2 Mrad(SiO2), the studied sensors are fully functional and most of the radiation hardened photodiodes … Show more

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Cited by 26 publications
(14 citation statements)
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“…By doing so, the onset of the dark current draining mechanism would not rely on the STI inversion anymore and thus, it would not be dependent on the TID nor on the annealing history of the irradiated sensor anymore. Such a pixel design has already been manufactured, irradiated and studied in the past (ELD design in [21]), but the biasing conditions that enables the dark current reduction mechanism was not explored at that time. Hence, future work could focus on studying the dark current draining mechanism in such design to potentially increase its effectiveness.…”
Section: B Possibilities For Pixel Design Improvementsmentioning
confidence: 99%
“…By doing so, the onset of the dark current draining mechanism would not rely on the STI inversion anymore and thus, it would not be dependent on the TID nor on the annealing history of the irradiated sensor anymore. Such a pixel design has already been manufactured, irradiated and studied in the past (ELD design in [21]), but the biasing conditions that enables the dark current reduction mechanism was not explored at that time. Hence, future work could focus on studying the dark current draining mechanism in such design to potentially increase its effectiveness.…”
Section: B Possibilities For Pixel Design Improvementsmentioning
confidence: 99%
“…This can be achieved with the so-called gated diodes [31][32][33]. The increase of such a current can be mitigated by changing the diode layout and avoiding thick oxide at the diode edges.…”
Section: Radiation Hardening By Designmentioning
confidence: 99%
“…2) Photodiode layout variations: In this section, the case of hardened photodiode designs is discussed. The matrix used is described in [20]. It contains photodiodes of several types: standard, recessed oxides, surrounded with a P+ doping profile or a gate (grounded).…”
Section: Design Variationsmentioning
confidence: 99%