1995
DOI: 10.1364/josab.12.000829
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Generation of squeezed states by holography

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Cited by 11 publications
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“…Zero bias external quantum efficiencies of 23%, 16% and 2.8% have been obtained at 850, 1298 and 1552 nm, respectively. In addition to the high efficency of Ge-on-Si diodes, Liu et al has shown that local strain introduction could shift the band edge of the Ge film from 1550 nm (0.80 eV) to 1605 nm (0.77 eV) that enhance the responsivity of such devices [51] in the upper L-band.…”
Section: Ge-based Photodetectorsmentioning
confidence: 99%
“…Zero bias external quantum efficiencies of 23%, 16% and 2.8% have been obtained at 850, 1298 and 1552 nm, respectively. In addition to the high efficency of Ge-on-Si diodes, Liu et al has shown that local strain introduction could shift the band edge of the Ge film from 1550 nm (0.80 eV) to 1605 nm (0.77 eV) that enhance the responsivity of such devices [51] in the upper L-band.…”
Section: Ge-based Photodetectorsmentioning
confidence: 99%